SCHEMBL6853213

SCHEMBL6853213

C[Si]1(C)CCC(c2ccc(O)c(N)c2)(c2ccc(O)c(N)c2)O[Si]1(C)C

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.36
ALOX15 P16050 4/20 0.36
HSD17B10 Q99714 4/20 0.36
GAA P10253 6/20 0.33
MAPT P10636 4/20 0.33
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
ALOX12 P18054 3/20 0.33
RECQL P46063 2/20 0.33
PKM P14618 2/20 0.33
HTT P42858 2/20 0.33
HIF1A Q16665 1/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
KDM4E B2RXH2 2/20 0.33
THRB P10828 1/20 0.33
BLM P54132 1/20 0.33
MCL1 Q07820 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
HPGD P15428 3/20 0.33
MAPK1 P28482 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6853464 0.88 CYP3A4 (0.34) ALOX15HSD17B10GAAMAPTMEN1
SCHEMBL954071 0.78 ALDH1A1 (0.37) ALDH1A1LMNA
SCHEMBL10664539 0.72 OPRD1 (0.32)
SCHEMBL1552116 0.71 OPRM1 (0.36)
SCHEMBL8783202 0.67 CA12 (0.30) CA12CA1CA2CA9
SCHEMBL13784873 0.65 ESR1 (0.61) ALDH1A1ALOX15HSD17B10GAAMAPT
SCHEMBL3011055 0.65 ALDH1A1 (0.42) ALDH1A1ALOX15HSD17B10GAAMAPT
SCHEMBL13784870 0.64 ESR1 (0.62) ALDH1A1ALOX15HSD17B10GAAMAPT
SCHEMBL28291224 0.64 ESR1 (0.62) ALDH1A1ALOX15HSD17B10GAAMAPT
SCHEMBL31364254 0.64 ESR1 (0.62) ALDH1A1ALOX15HSD17B10GAAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9410055-B2 Polybenzoxazole resin and precursor thereof MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-08-09 US disclosed
EP-2695906-A1 POLYBENZOXAZOLE RESIN AND PRECURSOR THEREOF Mitsubishi Gas Chemical Company, Inc. (JP) 2014-02-12 EP disclosed
US-20130324662-A1 POLYBENZOXAZOLE RESIN AND PRECURSOR THEREOF MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-12-05 US disclosed
US-6780561-B2 FOR FORMING PROTECTIVE FILM OR AN INSULATING FILM FOR A SEMICONDUCTOR ELEMENT OR A CIRCUIT BOARD SUCH AS A PRINTED BOARD KANSAI PAINT CO., LTD. (JP) 2004-08-24 US disclosed
US-20030143480-A1 For forming protective film or an insulating film for a semiconductor element or a circuit board such as a printed board KANSAI PAINT CO., LTD. (JP) 2003-07-31 US disclosed