Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EP300 | Q09472 | 2/20 | 0.43 |
| ▸ | KAT2B | Q92831 | 2/20 | 0.43 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.43 |
| ▸ | IDO1 | P14902 | 2/20 | 0.43 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.43 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.43 |
| ▸ | CSNK2A2 | P19784 | 1/20 | 0.37 |
| ▸ | CSNK2B | P67870 | 1/20 | 0.37 |
| ▸ | CSNK2A1 | P68400 | 1/20 | 0.37 |
| ▸ | CSNK2A3 | Q8NEV1 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.35 |
| ▸ | HSP90AB1 | P08238 | 1/20 | 0.35 |
| ▸ | PSMB5 | P28074 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 2/20 | 0.34 |
| ▸ | GFER | P55789 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6854234 | 0.84 | IDO1 (0.42) | EP300KAT2BKAT8IDO1HDAC3 | |
| SCHEMBL6854671 | 0.84 | EP300 (0.42) | EP300KAT2BKAT8IDO1HDAC3 | |
| Hydrochloric Acid SCHEMBL9797256 | 0.82 | IDO1 (0.40) | EP300KAT2BKAT8IDO1HDAC3 | |
| SCHEMBL9008984 | 0.82 | IDO1 (0.40) | EP300KAT2BKAT8IDO1HDAC3 | |
| SCHEMBL29436299 | 0.79 | EP300 (0.44) | EP300KAT2BKAT8IDO1HDAC3 | |
| SCHEMBL766115 | 0.79 | EP300 (0.44) | EP300KAT2BKAT8IDO1HDAC3 | |
| Hydrochloric Acid SCHEMBL4653071 | 0.77 | EP300 (0.42) | EP300KAT2BKAT8IDO1HDAC3 | |
| Hydrochloric Acid SCHEMBL30445419 | 0.77 | EP300 (0.42) | EP300KAT2BKAT8IDO1HDAC3 | |
| Hydrochloric Acid SCHEMBL8694604 | 0.77 | EP300 (0.42) | EP300KAT2BKAT8IDO1HDAC3 | |
| SCHEMBL9309357 | 0.74 | IDO1 (0.58) | EP300KAT2BKAT8IDO1HDAC3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11542397-B2 | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-03 | — | — | US | disclosed |
| US-20210309866-A1 | LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LIGHT-EMITTING DISPLAY ELEMENT PANEL, AND LIGHT-EMITTING DISPLAY DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-10-07 | — | — | US | disclosed |
| EP-3812805-A1 | LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LUMINESCENT DISPLAY ELEMENT PANEL, AND LUMINESCENT DISPLAY DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-04-28 | — | — | EP | disclosed |
| CN-112334795-A | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | 东京应化工业株式会社 | 2021-02-05 | — | — | CN | disclosed |
| CN-107429059-B | Energy-sensitive resin composition | 东京应化工业株式会社 | 2020-10-23 | — | — | CN | disclosed |
| CN-106575080-B | Energy-sensitive resin composition | 东京应化工业株式会社 | 2020-08-11 | — | — | CN | disclosed |
| US-10696845-B2 | Energy-sensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-30 | — | — | US | disclosed |
| US-10570269-B2 | Composition containing microparticles | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-02-25 | — | — | US | disclosed |
| EP-3275940-B1 | ENERGY-SENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2019-12-18 | — | — | EP | disclosed |
| CN-105579907-B | Radiation-sensitive composition and pattern production method | 东京应化工业株式会社 | 2019-12-17 | — | — | CN | disclosed |
| EP-2695906-A1 | POLYBENZOXAZOLE RESIN AND PRECURSOR THEREOF | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-02-12 | — | — | EP | disclosed |
| US-20130324662-A1 | POLYBENZOXAZOLE RESIN AND PRECURSOR THEREOF | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-12-05 | — | — | US | disclosed |
| US-6780561-B2 | FOR FORMING PROTECTIVE FILM OR AN INSULATING FILM FOR A SEMICONDUCTOR ELEMENT OR A CIRCUIT BOARD SUCH AS A PRINTED BOARD | KANSAI PAINT CO., LTD. (JP) | 2004-08-24 | — | — | US | disclosed |
| US-20030143480-A1 | For forming protective film or an insulating film for a semiconductor element or a circuit board such as a printed board | KANSAI PAINT CO., LTD. (JP) | 2003-07-31 | — | — | US | disclosed |
| US-5534614-A | Method for the preparation of amide oligomers and polybenzazole polymers therefrom | THE DOW CHEMICAL COMPANY (US) | 1996-07-09 | — | — | US | disclosed |
| US-5322916-A | Method for the preparation of amide oligomers and polybenzazole polymers therefrom | THE DOW CHEMICAL COMPANY (US) | 1994-06-21 | — | — | US | disclosed |
| US-5011753-A | Polyamides Containing Hexafluoroisopropylidene Groups Which May Be Cured To Form Polybenzoxazoles | HOECHST CELANESE CORPORATION (US) | 1991-04-30 | — | — | US | disclosed |
| US-4939215-A | CHEMICAL AND RADIATION RESISTANCE; AIRCRAFT, ELECTRONICS | HOECHST CELANESE CORPORATION (US) | 1990-07-03 | — | — | US | disclosed |
| US-4845183-A | MOLDING MATERIALS; FOR DIELECTRICS OR COATING SOLUTIONS; TOUGHNESS, FLEXIBILITY, TRANSPARENT | HOECHST CELANESE CORPORATION (US) | 1989-07-04 | — | — | US | disclosed |
| EP-0317942-A2 | Heat resistant polyamides and polybenzoxazoles from bis-[(aminohydroxyphenyl hexafluoro-isopropyl] diphenyl ethers | HOECHST CELANESE CORPORATION (US) | 1989-05-31 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10570269-B2 | Composition containing microparticles | CHMP4B, EXOSC10, EXOSC9 | EP300 2763/4885KAT2B 3359/4885KAT8 3961/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.