Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EP300 | Q09472 | 2/20 | 0.44 |
| ▸ | KAT2B | Q92831 | 2/20 | 0.44 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.44 |
| ▸ | IDO1 | P14902 | 2/20 | 0.44 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.44 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.44 |
| ▸ | CSNK2A2 | P19784 | 1/20 | 0.42 |
| ▸ | CSNK2B | P67870 | 1/20 | 0.42 |
| ▸ | CSNK2A1 | P68400 | 1/20 | 0.42 |
| ▸ | CSNK2A3 | Q8NEV1 | 1/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 5/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.39 |
| ▸ | HPGD | P15428 | 3/20 | 0.39 |
| ▸ | ALOX12 | P18054 | 3/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | PIM1 | P11309 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29436299 | 1.00 | EP300 (0.44) | EP300KAT2BKAT8IDO1HDAC3 | |
| Hydrochloric Acid SCHEMBL8694604 | 0.97 | EP300 (0.42) | EP300KAT2BKAT8IDO1HDAC3 | |
| Hydrochloric Acid SCHEMBL30445419 | 0.97 | EP300 (0.42) | EP300KAT2BKAT8IDO1HDAC3 | |
| Hydrochloric Acid SCHEMBL4653071 | 0.97 | EP300 (0.42) | EP300KAT2BKAT8IDO1HDAC3 | |
| Terephthalic Acid SCHEMBL9349893 | 0.82 | TP53 (0.48) | ALOX15HSD17B10TSHRALDH1A1HPGD | |
| SCHEMBL4958689 | 0.81 | ALOX15 (0.39) | EP300KAT2BKAT8IDO1HDAC3 | |
| SCHEMBL632398 | 0.81 | ALDH1A1 (0.42) | EP300KAT2BKAT8IDO1HDAC3 | |
| SCHEMBL6853785 | 0.79 | EP300 (0.43) | EP300KAT2BKAT8IDO1HDAC3 | |
| SCHEMBL632499 | 0.79 | EP300 (0.46) | EP300KAT2BKAT8IDO1HDAC3 | |
| SCHEMBL31256663 | 0.79 | EP300 (0.46) | EP300KAT2BKAT8IDO1HDAC3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 412 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024216910-A1 | HIGH-CHEMICAL-RESISTANCE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF | 明士(北京)新材料开发有限公司 | 2024-10-24 | — | — | WO | claimed |
| CN-116836389-B | Low-temperature-curable positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-01-26 | — | — | CN | claimed |
| CN-116836388-B | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-15 | — | — | CN | claimed |
| CN-114230792-B | Positive photosensitive polyimide resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116836388-A | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116836389-A | Low-temperature-curable positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116068852-B | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-07-14 | — | — | CN | claimed |
| CN-116149140-B | Positive photosensitive resin composition with high chemical resistance and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-07-14 | — | — | CN | claimed |
| CN-116149140-A | Positive photosensitive resin composition with high chemical resistance and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-05-23 | — | — | CN | claimed |
| CN-116068852-A | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-05-05 | — | — | CN | claimed |
| CN-101024724-A | Polymer electrolyte membrane, method of manufacturing the same and fuel cell including the same | SAMSUNG SDI CO LTD (KR) | 2007-08-29 | — | — | CN | claimed |
| CN-1301282-C | Polyimide comprising sulfonic acid group at the terminal of side chain, and polymer electrolyte and fuel cell using the same | SAMSUNG SDI CO LTD (KR) | 2007-02-21 | — | — | CN | claimed |
| WO-2006048547-A1 | METHOD FOR SYNTHESISING ZWITTERIONIC BENZOQUINONEMONOIMINE DERIVATIVES, THE THUS OBTAINED COMPOUNDS AND THE USE THEREOF | UNIVERSITE LOUIS PASTEUR (Etablissement Public à Caractère Scientifique, Culturel et Professionnel) (FR) | 2006-05-11 | — | — | WO | claimed |
| US-6960425-B2 | Method for laminating and patterning carbon nanotubes using chemical self-assembly process | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-11-01 | — | — | US | claimed |
| CN-1660922-A | Polyimide comprising sulfonic acid group at the terminal of side chain, and polymer electrolyte and fuel cell using the same | SAMSUNG SDI ELECTRONICS CO LTD (KR) | 2005-08-31 | — | — | CN | claimed |
| US-20050181257-A1 | Polyimide comprising sulfonic acid group at the terminal of side chain, and polymer electrolyte and fuel cell using the same | SAMSUNG SDI CO., LTD. (KR) | 2005-08-18 | — | — | US | claimed |
| EP-1455007-A2 | Method for depositing and patterning carbon nanotubes using chemical self-assembly process | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-09-08 | — | — | EP | claimed |
| US-20040142285-A1 | Method for laminating and patterning carbon nanotubes using chemical self-assembly process | SAMSUNG ELECTRONICS CO., LTD. | 2004-07-22 | — | — | US | claimed |
| CN-1500715-A | Lamination and picture composition method utilizing chemical self-assembly process | ���ǵ�����ʽ���� | 2004-06-02 | — | — | CN | claimed |
| WO-2004009534-A1 | BENZOQUINONEMONOIMINE DERIVATIVES, SYNTHESIS METHOD, DYEING COMPOSITIONS CONTAINING SAME AND USE THEREOF | UNIVERSITE LOUIS PASTEUR (FR) | 2004-01-29 | — | — | WO | claimed |