SCHEMBL6863551

SCHEMBL6863551

O=C(C(=O)c1ccccc1O[Si](Oc1ccccc1C(=O)C(=O)c1ccccc1)(Oc1ccccc1C(=O)C(=O)c1ccccc1)Oc1ccccc1C(=O)C(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CES2 O00748 12/20 0.52
CES1 P23141 11/20 0.52
SLC6A3 Q01959 1/20 0.41
NPC1 O15118 2/20 0.40
RAB9A P51151 2/20 0.40
ELANE P08246 1/20 0.39
AKR1C3 P42330 1/20 0.38
ALDH1A1 P00352 1/20 0.38
MAPT P10636 1/20 0.38
KMT2A Q03164 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4197049 0.82 CES2 (0.58) CES2CES1SLC6A3NPC1RAB9A
SCHEMBL6832601 0.81 CES2 (0.56) CES2CES1SLC6A3NPC1RAB9A
SCHEMBL5704292 0.79 RAB9A (0.62) CES2CES1SLC6A3NPC1RAB9A
SCHEMBL5666795 0.78 CES2 (0.52) CES2CES1SLC6A3NPC1RAB9A
SCHEMBL4579639 0.78 HTT (0.61) CES2CES1AKR1C3ALDH1A1MAPT
SCHEMBL11508105 0.78 CTNNB1 (0.62) CES2CES1RAB9AAKR1C3ALDH1A1
SCHEMBL8574337 0.77 CES2 (0.78) CES2CES1RAB9AAKR1C3ALDH1A1
SCHEMBL7120215 0.76 CES2 (0.50) CES2CES1SLC6A3NPC1RAB9A
SCHEMBL6369621 0.76 CES2 (0.50) CES2CES1SLC6A3NPC1ELANE
SCHEMBL738088 0.76 CES2 (0.61) CES2CES1NPC1RAB9AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6797453-B2 WHICH HAS RESOLUTION HIGH ENOUGH TO FORM THROUGH HOLE OR U-SHAPED DEPRESSION; COMPRISES SILANE COUPLING AGENT; FOR ELECTROLUMINESCENT LIQUID CRYSTAL DISPLAYS JSR CORPORATION (JP) 2004-09-28 US disclosed
US-20030215737-A1 Radiation sensitive composition for forming an insulating film, insulating film and display device JSR CORPORATION (JP) 2003-11-20 US disclosed
EP-1331518-A2 Radiation sensitive composition for forming an insulating film, insulating film and display device JSR Corporation (JP) 2003-07-30 EP disclosed
US-3950309-A MOLDING MATERIALS HITACHI CHEMICAL CO., LTD. (JA) 1976-04-13 US disclosed