SCHEMBL215978

SCHEMBL215978

CCc1ccc2c(c1)Cc1cccc(CC)c1[S+]2[O-]

nearest known ligand 0.31

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
SLC6A2 P23975 1/20 0.31
SLC6A4 P31645 1/20 0.31
SLC6A3 Q01959 1/20 0.31
NPC1 O15118 1/20 0.30
ALDH1A1 P00352 1/20 0.30
LMNA P02545 1/20 0.30
MAPT P10636 1/20 0.30
MAPK1 P28482 1/20 0.30
RAB9A P51151 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30
CYP1A2 P05177 1/20 0.30
CYP2A6 P11509 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4027300 0.89 NPC1 (0.30) NPC1ALDH1A1LMNAMAPTMAPK1
SCHEMBL6868808 0.84 GABRA1 (0.33)
SCHEMBL7044069 0.82 TRPA1 (0.36) SLC6A2SLC6A4SLC6A3NPC1ALDH1A1
SCHEMBL166962 0.81 CYP1A2 (0.38) SLC6A2SLC6A4SLC6A3NPC1ALDH1A1
SCHEMBL28150 0.79 KDM4E (0.30) NPC1RAB9A
SCHEMBL2307298 0.78 KDM4E (0.32) ALDH1A1MAPT
SCHEMBL9496684 0.74
SCHEMBL6860681 0.72 CYP1A2 (0.38) SLC6A2SLC6A4SLC6A3NPC1ALDH1A1
SCHEMBL4379538 0.70 HTR2A (0.39) SLC6A2SLC6A4ALDH1A1
SCHEMBL11632026 0.69 ALDH1A1 (0.44) NPC1ALDH1A1MAPTRAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025057864-A1 ORGANIC EL DISPLAY DEVICE, AND METHOD FOR MANUFACTURING SAME TOPPANホールディングス株式会社 2025-03-20 WO disclosed
US-11512204-B2 Squarylium dye and composition containing same TOYO INK SC HOLDINGS CO., LTD. (JP) 2022-11-29 US disclosed
US-11440993-B2 Triazine-ring-containing polymer and composition including same NISSAN CHEMICAL CORPORATION (JP) 2022-09-13 US disclosed
CN-111315800-B Triazine ring-containing polymer and composition comprising same 日产化学株式会社 2022-05-31 CN disclosed
CN-109071807-B Triazine ring-containing polymer and composition containing the same 日产化学株式会社 2021-07-06 CN disclosed
US-20210179779-A1 TRIAZINE-RING-CONTAINING POLYMER AND COMPOSITION INCLUDING SAME NISSAN CHEMICAL CORPORATION (JP) 2021-06-17 US disclosed
CN-108474885-B Near-infrared absorbing composition for solid-state imaging element, filter, and solid-state imaging element 东洋油墨SC控股株式会社 2021-04-13 CN disclosed
US-10928729-B2 Triazine-ring-containing polymer and composition including same NISSAN CHEMICAL CORPORATION (JP) 2021-02-23 US disclosed
US-10858519-B2 Near-infrared absorbing composition for solid-state imaging device and filter TOYO INK SC HOLDINGS CO., LTD. (JP) 2020-12-08 US disclosed
EP-3528046-B1 POSITIVE PHOTOSENSITIVE COMPOSITION AND THIN FILM TRANSISTOR KANEKA CORP (JP) 2020-09-09 EP disclosed
US-5266441-A Heat diffusible coloring compound, polymerizable binder CANON KABUSHIKI KAISHA (JP) 1993-11-30 US disclosed
US-5260164-A Silver halide, organic silver salt, cyclic reducing agent, the above compounds adapted to provide imagewise oxidized product of reducing agent upon imagewise exposure and heat development, polymer precursor, photopolymerization initiator CANON KABUSHIKI KAISHA (JP) 1993-11-09 US disclosed
US-5064744-A Heat, photopolymerization, silver halide contrast CANON KABUSHIKI KAISHA (JP) 1991-11-12 US disclosed
US-5041369-A Silver Halide, Silver Salt, Reducing Agent, Metal or Organic Dye CANON KABUSHIKI KAISHA (JP) 1991-08-20 US disclosed
US-5001032-A Photosensitive material containing a photosensitive and heat developable element and a polymerizable layer and image-forming method utilizing the same CANON KABUSHIKI KAISHA (JP) 1991-03-19 US disclosed
EP-0360014-A1 Photosensitive material and image forming method using same CANON KABUSHIKI KAISHA (JP) 1990-03-28 EP disclosed
EP-0332455-A2 Photosensitive material and image forming method CANON KABUSHIKI KAISHA (JP) 1989-09-13 EP disclosed
EP-0330504-A2 Photosensitive material and image forming method CANON KABUSHIKI KAISHA (JP) 1989-08-30 EP disclosed
EP-0328364-A2 Photosensitive material CANON KABUSHIKI KAISHA (JP) 1989-08-16 EP disclosed
EP-0326424-A2 Photosensitive composition, photosensitive material, and image forming method CANON KABUSHIKI KAISHA (JP) 1989-08-02 EP disclosed