SCHEMBL6884838

SCHEMBL6884838

CCCCCCCCC[Si](C)(C)OC

nearest known ligand 0.42

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.42
THRB P10828 1/20 0.42
LMNA P02545 3/20 0.42
EPHX1 P07099 1/20 0.37
DNM1 Q05193 6/20 0.33
ALDH1A1 P00352 3/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
HSD17B10 Q99714 1/20 0.33
SLC22A1 O15245 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30277142 1.00 TSHR (0.42) TSHRTHRBLMNAEPHX1DNM1
SCHEMBL30277229 1.00 TSHR (0.42) TSHRTHRBLMNAEPHX1DNM1
SCHEMBL14265451 1.00 TSHR (0.42) TSHRTHRBLMNAEPHX1DNM1
SCHEMBL5843393 1.00 TSHR (0.42) TSHRTHRBLMNAEPHX1DNM1
SCHEMBL33709 1.00 TSHR (0.42) TSHRTHRBLMNAEPHX1DNM1
SCHEMBL236670 1.00 TSHR (0.42) TSHRTHRBLMNAEPHX1DNM1
SCHEMBL6054003 1.00 TSHR (0.42) TSHRTHRBLMNAEPHX1DNM1
SCHEMBL2183246 1.00 TSHR (0.42) TSHRTHRBLMNAEPHX1DNM1
SCHEMBL5843473 1.00 TSHR (0.42) TSHRTHRBLMNAEPHX1DNM1
SCHEMBL30277222 1.00 TSHR (0.42) TSHRTHRBLMNAEPHX1DNM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260018421-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD CENTRAL GLASS CO LTD (JP) 2026-01-15 US disclosed
EP-4597547-A1 CHEMICAL SOLUTION, METHOD FOR PRODUCING MODIFIED SUBSTRATE, AND METHOD FOR PRODUCING LAYERED BODY FUJIFILM Corporation (JP) 2025-08-06 EP disclosed
US-20250215024-A1 CHEMICAL LIQUID, MANUFACTURING METHOD OF MODIFIED SUBSTRATE, AND MANUFACTURING METHOD OF LAMINATE FUJIFILM CORPORATION (JP) 2025-07-03 US disclosed
WO-2025105151-A1 METHOD OF MANUFACTURING TREATED SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR FUJIFILM CORPORATION (JP) 2025-05-22 WO disclosed
EP-4535405-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD Central Glass Company, Limited (JP) 2025-04-09 EP disclosed
EP-4535406-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD Central Glass Company, Limited (JP) 2025-04-09 EP disclosed
CN-119768898-A Chemical solution, method for producing modified substrate, and method for producing laminate 富士胶片株式会社 2025-04-04 CN disclosed
CN-113169060-B Chamfering part treating agent composition and method for manufacturing wafer 中央硝子株式会社 2025-04-01 CN disclosed
CN-119278503-A Substrate processing method and substrate manufacturing method 中央硝子株式会社 2025-01-07 CN disclosed
CN-119278504-A Substrate processing method and substrate manufacturing method 中央硝子株式会社 2025-01-07 CN disclosed
US-20230282474-A1 SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES AND SURFACE TREATMENT AGENT COMPOSITION CENTRAL GLASS COMPANY, LIMITED (JP) 2023-09-07 US disclosed
US-20230282473-A1 SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES AND SURFACE TREATMENT AGENT COMPOSITION CENTRAL GLASS COMPANY, LIMITED (JP) 2023-09-07 US disclosed
WO-2023127942-A1 COMPOSITION FOR FILM FORMATION AND METHOD FOR PRODUCING SUBSTRATE セントラル硝子株式会社 2023-07-06 WO disclosed
EP-4155375-A1 SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES, AND SURFACE TREATMENT AGENT COMPOSITION Central Glass Company, Limited (JP) 2023-03-29 EP disclosed
EP-4155376-A1 SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATE, AND SURFACE TREATMENT AGENT COMPOSITION Central Glass Company, Limited (JP) 2023-03-29 EP disclosed
CN-111233916-A Long carbon chain sulfur-containing silane coupling agent, and preparation method and application thereof 南京曙光精细化工有限公司 2020-06-05 CN disclosed
CN-107141313-A Transparent oxide electrode and its production method that surface modifier, surface for transparent oxide electrode are modified 信越化学工业株式会社 2017-09-08 CN disclosed
US-20040214381-A1 Process for the production of organic transistor and organic transistor PIONEER CORPORATION 2004-10-28 US disclosed
EP-1471586-A1 Process for the production of organic transistor and organic transistor Pioneer Corporation (JP) 2004-10-27 EP disclosed
CN-1540776-A Method of mfg. organic transistor and organic transistor �ձ������ȷ湫˾ 2004-10-27 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260018421-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD ESPL1, SMS, SGMS1 TSHR 2961/4885THRB 2882/4885LMNA 115/4885
US-20250215024-A1 CHEMICAL LIQUID, MANUFACTURING METHOD OF MODIFIED SUBSTRATE, AND MANUFACTURING METHOD OF LAMINATE EPM2A, AKR7A2, ALDOA TSHR 4812/4885THRB 4738/4885LMNA 31/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.