Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.48 |
| ▸ | TSHR | P16473 | 2/20 | 0.48 |
| ▸ | LMNA | P02545 | 5/20 | 0.39 |
| ▸ | CA2 | P00918 | 4/20 | 0.39 |
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 2/20 | 0.39 |
| ▸ | CA4 | P22748 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | EGFR | P00533 | 2/20 | 0.39 |
| ▸ | FYN | P06241 | 2/20 | 0.39 |
| ▸ | MMP9 | P14780 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | RECQL | P46063 | 2/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.39 |
| ▸ | CA5A | P35218 | 2/20 | 0.39 |
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | GMNN | O75496 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6265278 | 0.82 | ALDH1A1 (0.48) | ALDH1A1TDP1TSHRLMNACA2 | |
| SCHEMBL14991473 | 0.80 | ALDH1A1 (0.46) | ALDH1A1TDP1TSHRLMNACA2 | |
| SCHEMBL8847292 | 0.80 | ALDH1A1 (0.46) | ALDH1A1TDP1TSHRLMNACA2 | |
| SCHEMBL689225 | 0.79 | G6PD (0.37) | ALDH1A1TDP1TSHRLMNACA2 | |
| SCHEMBL2131539 | 0.78 | ALDH1A1 (0.45) | ALDH1A1TDP1TSHRLMNACA2 | |
| SCHEMBL2130849 | 0.78 | ALDH1A1 (0.45) | ALDH1A1TDP1TSHRLMNACA2 | |
| SCHEMBL15438040 | 0.78 | ALDH1A1 (0.45) | ALDH1A1TDP1TSHRLMNACA2 | |
| SCHEMBL3931625 | 0.78 | ALDH1A1 (0.45) | ALDH1A1TDP1TSHRLMNACA2 | |
| SCHEMBL28209509 | 0.78 | ALDH1A1 (0.45) | ALDH1A1TDP1TSHRLMNACA2 | |
| SCHEMBL15437698 | 0.78 | ALDH1A1 (0.45) | ALDH1A1TDP1TSHRLMNACA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4764578-A | Compositions of polyaryloxypyridine oligomers with phthalonitrile end groups, their preparation and use for manufacturing polyaryloxypyridine co-phthalocyanine lattices | CENTRE D'ETUDE DES MATERIAUX ORGANIQUES POUR TECHNOLOGIES AVANCEES (FR) | 1988-08-16 | — | — | US | claimed |
| JP-10077339-A | — | — | None | — | — | JP | disclosed |
| JP-6179743-A | — | — | None | — | — | JP | disclosed |
| CN-112218844-B | Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method | 三菱瓦斯化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| US-11747728-B2 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-09-05 | — | — | US | disclosed |
| US-20210109448-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-04-15 | — | — | US | disclosed |
| EP-3805191-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND RESIN PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-04-14 | — | — | EP | disclosed |
| CN-112218844-A | Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method | 三菱瓦斯化学株式会社 | 2021-01-12 | — | — | CN | disclosed |
| US-10292262-B2 | Reinforcing-plate-integrated flexible printed circuit board | KANEKA CORPORATION (JP) | 2019-05-14 | — | — | US | disclosed |
| US-10197915-B2 | Resin and photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2019-02-05 | — | — | US | disclosed |
| EP-1388758-A1 | Photosensitive heat resistant resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2004-02-11 | — | — | EP | disclosed |
| EP-1365289-A1 | PRECURSOR COMPOSITION FOR POSITIVE PHOTOSENSITIVE RESIN AND DISPLAY MADE WITH THE SAME | TORAY INDUSTRIES, INC. (JP) | 2003-11-26 | — | — | EP | disclosed |
| US-20030194631-A1 | Precursor composition for positive photosensitive resin and display made with the same | TORAY INDUSTRIES, INC. (JP) | 2003-10-16 | — | — | US | disclosed |
| WO-2002002862-A2 | TREATMENT OF FIBROUS SUBSTRATES WITH SILSESQUIOXANES AND STAINBLOCKERS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2002-01-10 | — | — | WO | disclosed |
| JP-H1077339-A | POLYCARBONATE RESIN, IRS PRODUCTION AND PLASTIC OPTICAL WAVEGUIDE PRODUCED BY USING THE RESIN | FURUKAWA ELECTRIC CO LTD:THE | 1998-03-24 | — | — | JP | disclosed |
| WO-1997028304-A1 | COMPOSITIONS AND METHODS FOR IMPARTING STAIN RESISTANCE AND STAIN RESISTANT ARTICLES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1997-08-07 | — | — | WO | disclosed |
| JP-H06179743-A | FLUORINE-CONTAINING POLYCARBONATE RESIN HAVING NAPHTHALENE RING | CHISSO CORP | 1994-06-28 | — | — | JP | disclosed |
| EP-0192190-B1 | FLUORINATED POLYURETHANES CONTAINING POLYOXYPERFLUOROALKYLENE BLOCKS | AUSIMONT S.p.A. (IT) | 1992-05-06 | — | — | EP | disclosed |
| US-4782130-A | FROM POLYETHER DIISOCYANATES AND CYCLIC POLYOLS, PROTECTIVE COATINGS, PROPELLANTS, ADHESIVES | AUSIMONT S.P.A. (IT) | 1988-11-01 | — | — | US | disclosed |
| EP-0192190-A2 | Fluorinated polyurethanes containing polyoxyperfluoroalkylene blocks | AUSIMONT S.p.A. (IT) | 1986-08-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11747728-B2 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | RER1, FEM1B, UNC119 | ALDH1A1 3198/4885TDP1 4301/4885TSHR 3874/4885 |
| US-20210109448-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN | RER1, FEM1B, UNC119 | ALDH1A1 3198/4885TDP1 4301/4885TSHR 3874/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.