SCHEMBL689989

SCHEMBL689989

C=COC(=O)c1ccc(O)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 5/20 0.54
CA2 P00918 5/20 0.54
CA12 O43570 4/20 0.54
CA7 P43166 4/20 0.54
CA9 Q16790 4/20 0.54
CA14 Q9ULX7 4/20 0.54
ALDH5A1 P51649 1/20 0.54
ABAT P80404 1/20 0.54
ESR1 P03372 5/20 0.48
ESR2 Q92731 3/20 0.48
MEN1 O00255 1/20 0.48
KMT2A Q03164 1/20 0.48
LMNA P02545 4/20 0.46
MAPT P10636 1/20 0.46
PKM P14618 1/20 0.46
HPGD P15428 1/20 0.46
HTT P42858 1/20 0.46
TSHR P16473 2/20 0.46
ALDH1A1 P00352 1/20 0.46
CHRM1 P11229 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL295796 0.91 ALDH1A1 (0.40) CA1CA2CA12CA7CA9
SCHEMBL28944014 0.89 ALDH1A1 (0.39) CA1CA2CA12CA7CA9
SCHEMBL19506902 0.84 PDCD1 (0.41) CA1CA2CA12CA9CA14
SCHEMBL787166 0.83 TSHR (0.52) CA1CA2CA12CA7CA9
Acetic Acid SCHEMBL27275952 0.83 TSHR (0.40) CA1CA2CA12CA7CA9
SCHEMBL24858286 0.81 ALDH1A1 (0.46) CA1CA2ALDH5A1ABATKMT2A
SCHEMBL10951785 0.81 LMNA (0.50) MEN1KMT2ALMNAMAPTPKM
SCHEMBL2835113 0.81 CES2 (0.48) CA1CA2MEN1KMT2AMAPT
SCHEMBL24858702 0.81 CA1 (0.57) CA1CA2CA12CA7CA9
SCHEMBL19506924 0.81 PARP10 (0.48) CA1CA2KMT2ALMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2065409-B1 NOVEL FLUORINE-CONTAINING POLYMER ASAHI GLASS CO LTD (JP) 2015-04-01 EP claimed
US-7947791-B2 Fluorinated polymer ASAHI GLASS COMPANY, LIMITED (JP) 2011-05-24 US claimed
US-20090186986-A1 NOVEL FLUORINATED POLYMER ASAHI GLASS COMPANY, LIMITED (JP) 2009-07-23 US claimed
EP-2065409-A1 NOVEL FLUORINE-CONTAINING POLYMER Asahi Glass Company, Limited (JP) 2009-06-03 EP claimed
EP-0855620-B1 Positive photoresist composition JSR CORP (JP) 2002-09-11 EP claimed
US-5942369-A ALKALI-SOLUBLE NOVOLAK RESIN; ALKALI SOLUBLE ACRYLIC RESIN OF RADICAL-POLYMERIZABLE UNITS CONTAINING A: HYDROXYL GROUP, CARBOXYL GROUP, OR PHENOLIC HYDROXYL GROUP; QUINONEDIAZIDE AND SOLVENT; THICK FILMS AS BUMP FORMING MATERIALS JSR CORPORATION (JP) 1999-08-24 US claimed
EP-0855620-A1 Positive photoresist composition JSR Corporation (JP) 1998-07-29 EP claimed
CN-118496497-A Preparation method and equipment of polyamide 上海凯赛生物技术股份有限公司 2024-08-16 CN disclosed
US-20230002520-A1 CURABLE COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2023-01-05 US disclosed
CN-110117835-B Nylon fiber and preparation method thereof 上海凯赛生物技术股份有限公司 2021-12-07 CN disclosed
CN-110117831-B Nylon fiber and preparation method thereof 上海凯赛生物技术股份有限公司 2021-12-07 CN disclosed
CN-110117833-B Nylon fiber and preparation method thereof 上海凯赛生物技术股份有限公司 2021-12-07 CN disclosed
CN-110117834-B Nylon fiber and preparation method thereof 上海凯赛生物技术股份有限公司 2021-12-07 CN disclosed
US-5942369-A ALKALI-SOLUBLE NOVOLAK RESIN; ALKALI SOLUBLE ACRYLIC RESIN OF RADICAL-POLYMERIZABLE UNITS CONTAINING A: HYDROXYL GROUP, CARBOXYL GROUP, OR PHENOLIC HYDROXYL GROUP; QUINONEDIAZIDE AND SOLVENT; THICK FILMS AS BUMP FORMING MATERIALS JSR CORPORATION (JP) 1999-08-24 US disclosed
EP-0855620-A1 Positive photoresist composition JSR Corporation (JP) 1998-07-29 EP disclosed
EP-0761702-A2 Novel acrylic copolymer elastomer, its blend rubber and blend rubber composition NIPPON MEKTRON, LTD. (JP) 1997-03-12 EP disclosed
US-5427887-A Blend of a diazo resin and an alkali soluble and swellable polymer KONICA CORPORATION (JP) 1995-06-27 US disclosed
US-5071738-A Containing dispersion of hydrophobic dye image forming couplers and water insoluble-vinyl phenol derivative polymer; storage stability KONICA CORPORATION (JP) 1991-12-10 US disclosed
EP-0383354-A2 Silver halide photographic material KONICA CORPORATION (JP) 1990-08-22 EP disclosed
US-4772658-A ADDITION POLYMERIZATION, POLYISOCYANATE-UNSATURATED ALCOHOL ADDUCT, POLYURETHANES, MOLDINGS THE DOW CHEMICAL COMPANY (US) 1988-09-20 US disclosed