Hydrochloric Acid

Hydrochloric Acid

SCHEMBL6903918

C1=CC([Ti+2](=C(c2ccccc2)c2ccccc2)C2c3ccccc3-c3ccccc32)c2ccccc21.[Cl-].[Cl-]

nearest known ligand 0.34

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.30
CYP2D6 P10635 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL6906419 0.88 ATM (0.34) ATM
Hydrochloric Acid SCHEMBL713786 0.82 POLB (0.33) CYP2D6
Hydrochloric Acid SCHEMBL6905914 0.81 MAPT (0.33) ATM
Hydrochloric Acid SCHEMBL7914795 0.76 MEN1 (0.34) ATM
Hydrochloric Acid SCHEMBL7109966 0.74 HTR6 (0.31) CYP2D6
Hydrochloric Acid SCHEMBL714328 0.72 HTR2A (0.33) CYP2D6
Hydrochloric Acid SCHEMBL396459 0.71 HTR2A (0.33) CYP2D6
SCHEMBL7633756 0.70
SCHEMBL7035683 0.69 GPR3 (0.31) CYP2D6
Hydrochloric Acid SCHEMBL30630878 0.69 HTR2A (0.39) CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6790917-B2 POLYMERIZING A VINYL COMPOUND IN PRESENCE OF A CATALYST OBTAINED BY COMBINING ORGANOTRANSITION METAL COMPOUND, AN ALUMINUM COMPUND OR ALUMOXANE AND A BORON COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-09-14 US disclosed
US-20020198340-A1 Process for producing vinyl compound polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-12-26 US disclosed