SCHEMBL6908148

SCHEMBL6908148

CC1(C)C2CCC1(C)C(C1(C(=O)O)CC3C=CC1C3)C2

nearest known ligand 0.35

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.34
MAPT P10636 1/20 0.34
MAPK1 P28482 1/20 0.34
CYP2C19 P33261 1/20 0.34
MEN1 O00255 1/20 0.34
HTT P42858 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
EPHX2 P34913 6/20 0.33
CYP19A1 P11511 2/20 0.32
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
ELANE P08246 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8962150 0.69 MAPT (0.48) KMT2AMAPTMAPK1CYP2C19CYP19A1
SCHEMBL8996485 0.67 EPHX2 (0.38) KMT2AMAPTMAPK1CYP2C19MEN1
SCHEMBL6230510 0.66 KMT2A (0.38) KMT2AMAPTMAPK1CYP2C19MEN1
SCHEMBL5423530 0.65 P2RX7 (0.41) KMT2ACYP2C19MEN1ALDH1A1
SCHEMBL12191694 0.65 P2RX7 (0.41) KMT2ACYP2C19MEN1ALDH1A1
SCHEMBL32688678 0.65 P2RX7 (0.41) KMT2ACYP2C19MEN1ALDH1A1
SCHEMBL76783 0.65 P2RX7 (0.41) KMT2ACYP2C19MEN1ALDH1A1
SCHEMBL10388136 0.64 KDM4E (0.34) CYP2C19EPHX2LMNA
SCHEMBL5318552 0.64 CYP2D6 (0.33) CYP2C19EPHX2
SCHEMBL7714730 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6753127-B2 USING MIXTURE OF NORBORNENE POLYMER, ACID GENERATOR AND SOLVENT; PREBAKING, EXPOSURE TO RADIATION SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-06-22 US disclosed
US-20030118933-A1 Norbornene-based copolymer for photoresist, preparation method thereof, and photoresist composition comprising the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2003-06-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030118933-A1 Norbornene-based copolymer for photoresist, preparation method thereof, and photoresist composition comprising the same ARF1, PTK2, DNAJA1 KMT2A 2531/4885MAPT 2384/4885MAPK1 2614/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.