SCHEMBL6912491

SCHEMBL6912491

CCc1cccc2c1CC=C2

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 4/20 0.40
GABRB2 P47870 4/20 0.40
HTR2A P28223 4/20 0.35
HTR2B P41595 2/20 0.35
SLC6A2 P23975 1/20 0.35
SLC6A4 P31645 1/20 0.35
HRH1 P35367 1/20 0.35
OPRD1 P41143 1/20 0.35
OPRK1 P41145 1/20 0.35
HTR3A P46098 1/20 0.35
SLC6A3 Q01959 1/20 0.35
HTR2C P28335 3/20 0.34
HTR1A P08908 2/20 0.34
DRD2 P14416 2/20 0.34
DRD4 P21917 2/20 0.34
DRD3 P35462 2/20 0.34
MGLL Q99685 2/20 0.33
LMNA P02545 1/20 0.32
MAPT P10636 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6912026 0.85 HTR2A (0.34) HTR2AHTR2BSLC6A2SLC6A4HRH1
SCHEMBL7185336 0.83 SLC6A2 (0.36) HTR2AHTR2BSLC6A2SLC6A4HRH1
SCHEMBL7189957 0.83 SLC6A2 (0.36) HTR2AHTR2BSLC6A2SLC6A4HRH1
SCHEMBL6913429 0.82 LIPG (0.35) HTR2AHTR2BSLC6A2SLC6A4HRH1
SCHEMBL19314096 0.81 GABRA1 (0.38) GABRA1GABRB2HTR2AHTR2CHTR1A
SCHEMBL18680264 0.80 L3MBTL1 (0.37) GABRA1GABRB2HTR2AHTR2BSLC6A2
SCHEMBL14646043 0.80 LIPG (0.41) MAPT
SCHEMBL12319674 0.80 SLC6A2 (0.35) HTR2AHTR2BSLC6A2SLC6A4HRH1
SCHEMBL12319675 0.80 PNMT (0.42) HTR2AHTR2BSLC6A2SLC6A4HRH1
SCHEMBL1319130 0.80 SLC6A2 (0.35) HTR2AHTR2BSLC6A2SLC6A4HRH1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12441901-B2 Quantum dot ink composition, and quantum dot electroluminescent device SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-10-14 US disclosed
US-20230287231-A1 QUANTUM DOT INK COMPOSITION, AND QUANTUM DOT ELECTROLUMINESCENT DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-09-14 US disclosed
CN-116606568-A Quantum dot ink composition and quantum dot electroluminescent device 三星电子株式会社 2023-08-18 CN disclosed
US-20230257607-A1 QUANTUM DOT INK COMPOSITION, AND QUANTUM DOT ELECTROLUMINESCENT DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-08-17 US disclosed
CN-112105654-A Curable resin mixture, curable resin composition, and cured product thereof 日本化药株式会社 2020-12-18 CN disclosed
WO-2020031935-A1 CURABLE RESIN MIXTURE, CURABLE RESIN COMPOSITION, AND CURED PRODUCT 日本化薬株式会社 2020-02-13 WO disclosed
CN-1189435-C Novel transition metal compound and catalyst containing the same for polymerization of olefins JAPAN POLYOLEFINS CO LTD (JP) 2005-02-16 CN disclosed
EP-0969010-B1 Transition metal compound and catalyst containing the same for polymerization of olefins JAPAN POLYOLEFINS CO LTD (JP) 2004-09-22 EP disclosed
US-6352953-B1 TRANSITION METAL COMPLEX HAVING 5-MEMBERED RING FORMED BY TRANSITION METAL COMPOUND OF GROUP IVB, TWO CARBONS, METAL OF GROUP IIIA AND HYDROGEN JAPAN POLYOLEFINS CO., LTD. (JP) 2002-03-05 US disclosed
US-6150544-A Transition metal compound and catalyst containing the same for polymerization of olefins JAPAN POLYOLEFINS CO., LTD. (JP) 2000-11-21 US disclosed
CN-1240782-A Novel transition metal compound and catalyst containing the same for polymerization of olefins JAPAN POLYOLEFINS CO LTD (JP) 2000-01-12 CN disclosed
EP-0969010-A2 Transition metal compound and catalyst containing the same for polymerization of olefins Japan Polyolefins Co., Ltd. (JP) 2000-01-05 EP disclosed
EP-0659774-B1 Process for producing styrenic polymer IDEMITSU KOSAN CO (JP) 1999-03-03 EP disclosed
EP-0505972-B1 Process for producing styrenic copolymer IDEMITSU KOSAN CO (JP) 1997-06-11 EP disclosed
US-5623034-A Process for producing styrenic polymer IDEMITSU KOSAN CO., LTD. (JP) 1997-04-22 US disclosed
EP-0659774-A2 Process for producing styrenic polymer IDEMITSU KOSAN COMPANY LIMITED (JP) 1995-06-28 EP disclosed
EP-0505972-A2 Process for producing styrenic copolymer IDEMITSU KOSAN COMPANY LIMITED (JP) 1992-09-30 EP disclosed