Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1A | P48039 | 11/20 | 0.43 |
| ▸ | MTNR1B | P49286 | 11/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.32 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.32 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.32 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21117245 | 0.81 | MTNR1A (0.46) | MTNR1AMTNR1BKDM4EOPRM1OPRD1 | |
| SCHEMBL10267902 | 0.81 | MTNR1A (0.52) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL2778436 | 0.79 | TAS1R3 (0.40) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL2776949 | 0.79 | MTNR1A (0.48) | MTNR1AMTNR1BKDM4EOPRM1OPRL1 | |
| SCHEMBL20306559 | 0.79 | MTNR1A (0.48) | MTNR1AMTNR1BKDM4EOPRM1OPRL1 | |
| SCHEMBL18826331 | 0.78 | MTNR1A (0.47) | MTNR1AMTNR1BKDM4E | |
| SCHEMBL16943708 | 0.78 | MTNR1A (0.50) | MTNR1AMTNR1BKDM4EOPRM1OPRL1 | |
| SCHEMBL1618606 | 0.77 | MTNR1A (0.38) | MTNR1AMTNR1BKDM4EOPRM1OPRK1 | |
| SCHEMBL18973595 | 0.77 | — | — | |
| SCHEMBL17070956 | 0.76 | MTNR1A (0.39) | MTNR1AMTNR1BKDM4EOPRM1OPRD1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 204 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1964893-B2 | Ink composition, inkjet recording method, printed material, and ink set | FUJIFILM CORP (JP) | 2021-11-24 | — | — | EP | disclosed |
| US-10007178-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| EP-2105478-B1 | Inkjet recording method and inkjet recording system | FUJIFILM CORP (JP) | 2018-02-28 | — | — | EP | disclosed |
| EP-1964893-B1 | Ink composition, inkjet recording method, printed material, and ink set | FUJIFILM CORP (JP) | 2018-01-24 | — | — | EP | disclosed |
| US-9869931-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-16 | — | — | US | disclosed |
| US-9869931-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-16 | — | — | US | disclosed |
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| EP-2042568-A1 | Ink composition, inkjet recording method, and printed material | FUJIFILM Corporation (JP) | 2009-04-01 | — | — | EP | disclosed |
| US-20090081420-A1 | INK COMPOSITION, INKJET RECORDING METHOD, AND PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090081420-A1 | INK COMPOSITION, INKJET RECORDING METHOD, AND PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |
| EP-1964893-A1 | Ink composition, inkjet recording method, printed material, and ink set | FUJIFILM Corporation (JP) | 2008-09-03 | — | — | EP | disclosed |
| US-20080206527-A1 | INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, AND INK SET | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080206527-A1 | INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, AND INK SET | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080075882-A1 | PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL, AND MOLDED PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080075882-A1 | PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL, AND MOLDED PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080075884-A1 | radiation curing ink cures with high sensitivity to form a high quality, durable image resistant to cracking, peeling and has excellent impact resistance, flexibility, and adhesion; a polymerizable monomer and a polymerization initiator and comprising substantially no colorant | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080075884-A1 | radiation curing ink cures with high sensitivity to form a high quality, durable image resistant to cracking, peeling and has excellent impact resistance, flexibility, and adhesion; a polymerizable monomer and a polymerization initiator and comprising substantially no colorant | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |