SCHEMBL6918643

SCHEMBL6918643

NC(=O)C1C2C=CC(C2)C1C(=O)NOS(=O)(=O)c1ccc(C(F)(F)F)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ENPP3 O14638 5/20 0.41
ENPP1 P22413 4/20 0.41
ENPP2 Q13822 4/20 0.41
ALDH1A1 P00352 2/20 0.40
GAA P10253 2/20 0.40
CA1 P00915 2/20 0.37
CA2 P00918 2/20 0.37
CA12 O43570 1/20 0.37
MAPT P10636 1/20 0.37
CA9 Q16790 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
CYP2C19 P33261 1/20 0.35
SLC1A3 P43003 1/20 0.34
SLC1A2 P43004 1/20 0.34
SLC1A1 P43005 1/20 0.34
EPHX2 P34913 1/20 0.34
KIF11 P52732 1/20 0.34
MMP1 P03956 2/20 0.34
MMP8 P22894 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5136454 0.84 CA1 (0.47) ENPP3ENPP1ENPP2ALDH1A1GAA
SCHEMBL5472080 0.80 ALDH1A1 (0.36) ALDH1A1GAATDP1CYP2C19
SCHEMBL6567261 0.79 ENPP3 (0.38) ENPP3ENPP1ENPP2GAACA1
SCHEMBL4780072 0.77 ALDH1A1 (0.39) ALDH1A1GAACA1CA2MAPT
SCHEMBL14142598 0.77 CA1 (0.41) ENPP3ENPP1ENPP2ALDH1A1GAA
SCHEMBL6568143 0.77 ALDH1A1 (0.36) ALDH1A1GAACA1CA2SMN1; SMN2
SCHEMBL20377380 0.76 ALDH1A1 (0.38) ALDH1A1GAACA1CA2SMN1; SMN2
SCHEMBL382670 0.75 ALDH1A1 (0.54) ALDH1A1GAACA1CA2MAPT
SCHEMBL3863054 0.71 F2 (0.40) ALDH1A1GAACA1CA2CA9
SCHEMBL12937328 0.69 ALDH1A1 (0.35) ALDH1A1GAACA1CA2SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1739485-B1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2016-08-31 EP disclosed
US-20040191672-A1 Resist composition MITSUBISHI GAS CHEMICAL CO., LTD. (JP) 2004-09-30 US disclosed