Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MCL1 | Q07820 | 2/20 | 0.63 |
| ▸ | KDM4E | B2RXH2 | 13/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 13/20 | 0.58 |
| ▸ | HPGD | P15428 | 10/20 | 0.58 |
| ▸ | HSD17B10 | Q99714 | 9/20 | 0.58 |
| ▸ | TSHR | P16473 | 3/20 | 0.58 |
| ▸ | MAPT | P10636 | 2/20 | 0.58 |
| ▸ | MEN1 | O00255 | 2/20 | 0.58 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.58 |
| ▸ | GAA | P10253 | 4/20 | 0.54 |
| ▸ | GLA | P06280 | 3/20 | 0.54 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.54 |
| ▸ | HSP90AB1 | P08238 | 1/20 | 0.54 |
| ▸ | ALPG | P10696 | 1/20 | 0.54 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.54 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.54 |
| ▸ | CASP1 | P29466 | 1/20 | 0.54 |
| ▸ | CASP7 | P55210 | 1/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.54 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30819091 | 0.85 | KDM4E (0.66) | MCL1KDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL606446 | 0.85 | KDM4E (0.66) | MCL1KDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL11855333 | 0.83 | MCL1 (0.54) | MCL1KDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL8807762 | 0.79 | KDM4E (0.70) | MCL1KDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL591362 | 0.78 | KDM4E (0.78) | MCL1KDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL8359237 | 0.78 | MCL1 (1.00) | MCL1KDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL31282379 | 0.76 | KDM4E (0.70) | MCL1KDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL2183416 | 0.76 | KDM4E (0.70) | MCL1KDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL9367076 | 0.76 | KDM4E (0.54) | MCL1KDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL4271081 | 0.75 | KDM4E (0.50) | MCL1KDM4EALDH1A1HPGDHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8129087-B2 | Block copolymer and substrate processing method | CANON KABUSHIKI KAISHA (JP) | 2012-03-06 | — | — | US | disclosed |
| CN-101256358-B | Photosensitive compound, polyhydroxystyrene and novolac resin | CANON KK | 2011-06-22 | — | — | CN | disclosed |
| US-20090311637-A1 | BLOCK COPOLYMER AND SUBSTRATE PROCESSING METHOD | CANON KABUSHIKI KAISHA (JP) | 2009-12-17 | — | — | US | disclosed |
| US-7615332-B2 | Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process | CANON KABUSHIKI KAISHA (JP) | 2009-11-10 | — | — | US | disclosed |
| US-20090233232-A1 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS | CANON KABUSHIKI KAISHA (JP) | 2009-09-17 | — | — | US | disclosed |
| CN-101256358-A | Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process | CANON KK (JP) | 2008-09-03 | — | — | CN | disclosed |
| EP-1956430-A1 | Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process | Canon Kabushiki Kaisha (JP) | 2008-08-13 | — | — | EP | disclosed |
| US-20080187864-A1 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS | CANON KABUSHIKI KAISHA (JP) | 2008-08-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090233232-A1 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS | FRG1, PAH, RER1 | MCL1 3334/4885KDM4E 2439/4885ALDH1A1 1256/4885 |
| US-20080187864-A1 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS | FRG1, PAH, RER1 | MCL1 3334/4885KDM4E 2439/4885ALDH1A1 1256/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.