Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TYMS | P04818 | 7/20 | 0.60 |
| ▸ | POLB | P06746 | 5/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.44 |
| ▸ | BCL2 | P10415 | 2/20 | 0.41 |
| ▸ | MCL1 | Q07820 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.40 |
| ▸ | RECQL | P46063 | 2/20 | 0.40 |
| ▸ | CASP6 | P55212 | 2/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.40 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | APEX1 | P27695 | 1/20 | 0.38 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.38 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.38 |
| ▸ | CYSLTR1 | Q9Y271 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3006980 | 0.80 | POLB (0.50) | POLBKDM4EALDH1A1L3MBTL1MEN1 | |
| SCHEMBL8427336 | 0.77 | TYMS (1.00) | TYMSPOLBKDM4EALDH1A1L3MBTL1 | |
| SCHEMBL30714778 | 0.77 | TYMS (1.00) | TYMSPOLBKDM4EALDH1A1L3MBTL1 | |
| SCHEMBL17726870 | 0.75 | MAPT (0.43) | TYMSPOLBBCL2MCL1ALDH1A1 | |
| SCHEMBL11558315 | 0.75 | TYMS (0.42) | TYMSPOLBKDM4EBCL2MCL1 | |
| SCHEMBL23430836 | 0.72 | MCL1 (0.56) | TYMSPOLBKDM4EBCL2MCL1 | |
| SCHEMBL19384682 | 0.72 | TYMS (0.77) | TYMSPOLBKDM4EALDH1A1L3MBTL1 | |
| SCHEMBL16291732 | 0.71 | TYMS (0.53) | TYMSPOLBKDM4EBCL2MCL1 | |
| SCHEMBL11051059 | 0.70 | TYMS (0.52) | TYMSPOLBKDM4EMCL1ALDH1A1 | |
| SCHEMBL3413891 | 0.70 | TYMS (0.68) | TYMSPOLBKDM4EALDH1A1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6582879-B2 | Specified photo acid generating agent used in heat resistant photoresist composition which contains polyamide oligomer containing ester groups as pendant groups; minimize post-exposure baking process and post-exposure delay effect | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 2003-06-24 | — | — | US | disclosed |
| US-20030064315-A1 | Reactive photo acid-generating agent and heat-resistant photoresist composition with polyamide precursor | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY | 2003-04-03 | — | — | US | disclosed |