SCHEMBL6955079

SCHEMBL6955079

N=C(NN)c1ccccc1Cc1ccccc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 3/20 0.49
CYP2C19 P33261 3/20 0.49
CYP1A2 P05177 2/20 0.49
CYP2C9 P11712 2/20 0.49
TSHR P16473 3/20 0.48
CYP3A4 P08684 2/20 0.48
HTR2A P28223 1/20 0.43
CA1 P00915 2/20 0.43
CA2 P00918 2/20 0.43
CAPN1 P07384 1/20 0.42
BCL2 P10415 1/20 0.41
BCL2L1 Q07817 1/20 0.41
CA9 Q16790 1/20 0.40
ALDH1A1 P00352 1/20 0.40
MAPT P10636 1/20 0.40
NFKB1 P19838 1/20 0.40
BLM P54132 1/20 0.40
PMP22 Q01453 1/20 0.40
HIF1A Q16665 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6961344 0.84 ALDH1A1 (0.51) CYP2D6CYP2C19CYP1A2CYP2C9TSHR
SCHEMBL6955302 0.81 MAOA (0.43) BCL2L1ALDH1A1L3MBTL1
SCHEMBL6958346 0.80 SIGMAR1 (0.43) BCL2L1ALDH1A1MAPT
SCHEMBL6961297 0.80 SIGMAR1 (0.43) BCL2L1ALDH1A1MAPT
SCHEMBL11262697 0.79 CYP2D6 (0.53) CYP2D6CYP2C19CYP1A2CYP2C9TSHR
Hydrochloric Acid SCHEMBL28584054 0.78 CYP2D6 (0.51) CYP2D6CYP2C19CYP1A2CYP2C9TSHR
SCHEMBL10519928 0.76 CTSD (0.38) CYP2D6CYP2C19CYP1A2CYP2C9CYP3A4
SCHEMBL6958331 0.75 ALDH1A1 (0.37) CYP2D6CYP2C19CYP1A2CYP2C9TSHR
SCHEMBL6957513 0.74 PLA2G10 (0.53) CYP2C9ALDH1A1MAPTPRSS1PRSS2
Hydrochloric Acid SCHEMBL6686934 0.74 BLM (0.39) CYP2D6CYP2C19CYP1A2CYP2C9CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0711762-B1 PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS SUMITOMO CHEMICAL CO (JP) 2003-08-06 EP disclosed
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed