SCHEMBL6955372

SCHEMBL6955372

COc1ccc(COCCCCc2ccc(-c3ccccc3-c3nnn[nH]3)cc2)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 4/20 0.57
TDP1 Q9NUW8 1/20 0.57
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
MAPT P10636 1/20 0.37
MAPK1 P28482 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
NOD2 Q9HC29 1/20 0.37
GBA1 P04062 2/20 0.37
UGCG Q16739 2/20 0.37
GBA2 Q9HCG7 2/20 0.37
FFAR1 O14842 1/20 0.37
FFAR4 Q5NUL3 1/20 0.37
SYK P43405 1/20 0.36
AURKB Q96GD4 1/20 0.36
INCENP Q9NQS7 1/20 0.36
GP6 Q9HCN6 1/20 0.36
CALM1 P0DP23 1/20 0.36
ABL1 P00519 1/20 0.36
ABCB1 P08183 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6956490 0.99 L3MBTL1 (0.59) L3MBTL1TDP1MEN1KMT2AMAPT
SCHEMBL6954735 0.97 L3MBTL1 (0.52) L3MBTL1TDP1MEN1KMT2AMAPT
SCHEMBL6956459 0.93 TDP1 (0.45) L3MBTL1TDP1MEN1KMT2AMAPT
SCHEMBL6961113 0.90 L3MBTL1 (0.47) L3MBTL1TDP1MEN1KMT2AGP6
SCHEMBL6957447 0.89 L3MBTL1 (0.49) L3MBTL1TDP1MEN1KMT2AGBA1
SCHEMBL6956662 0.87 L3MBTL1 (0.42) L3MBTL1TDP1MEN1KMT2AGP6
SCHEMBL6961580 0.84 GP6 (0.36) L3MBTL1TDP1GP6
SCHEMBL6956942 0.83 GP6 (0.36) L3MBTL1TDP1GP6
SCHEMBL6961280 0.82 GP6 (0.44) L3MBTL1TDP1GP6
SCHEMBL6961694 0.82 ABL1 (0.51) L3MBTL1MEN1KMT2AMAPTABL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0711762-B1 PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS SUMITOMO CHEMICAL CO (JP) 2003-08-06 EP disclosed
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed