SCHEMBL6957447

SCHEMBL6957447

c1ccc(COCCCCCCCCc2ccc(-c3ccccc3-c3nnn[nH]3)cc2)cc1

nearest known ligand 0.49

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.49
TDP1 Q9NUW8 1/20 0.49
GP6 Q9HCN6 1/20 0.38
HRH4 Q9H3N8 2/20 0.38
HRH3 Q9Y5N1 2/20 0.38
SPHK1 Q9NYA1 2/20 0.37
NAAA Q02083 2/20 0.35
UGCG Q16739 6/20 0.35
GBA2 Q9HCG7 6/20 0.35
GBA1 P04062 5/20 0.35
LCT P09848 2/20 0.35
SI P14410 2/20 0.35
MGAM O43451 1/20 0.35
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6961113 0.99 L3MBTL1 (0.47) L3MBTL1TDP1GP6HRH4HRH3
SCHEMBL6956662 0.95 L3MBTL1 (0.42) L3MBTL1TDP1GP6HRH4HRH3
SCHEMBL6961280 0.91 GP6 (0.44) L3MBTL1TDP1GP6HRH4HRH3
SCHEMBL6956490 0.91 L3MBTL1 (0.59) L3MBTL1TDP1GP6UGCGGBA2
SCHEMBL6955372 0.89 L3MBTL1 (0.57) L3MBTL1TDP1GP6UGCGGBA2
SCHEMBL6957640 0.87 TSHR (0.43) GP6
SCHEMBL6954735 0.86 L3MBTL1 (0.52) L3MBTL1TDP1GP6UGCGGBA2
SCHEMBL6956942 0.85 GP6 (0.36) L3MBTL1TDP1GP6NAAA
SCHEMBL6961580 0.83 GP6 (0.36) L3MBTL1TDP1GP6
SCHEMBL6956381 0.82 CA2 (0.36) GP6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0711762-B1 PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS SUMITOMO CHEMICAL CO (JP) 2003-08-06 EP disclosed
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed