Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GP6 | Q9HCN6 | 1/20 | 0.36 |
| ▸ | AGTR1 | P30556 | 4/20 | 0.35 |
| ▸ | AGTR2 | P50052 | 4/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 4/20 | 0.34 |
| ▸ | CMKLR1 | Q99788 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | MLNR | O43193 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6956942 | 0.99 | GP6 (0.36) | GP6AGTR1AGTR2HSD11B1CMKLR1 | |
| SCHEMBL6961186 | 0.96 | GP6 (0.37) | GP6AGTR1AGTR2HSD11B1CMKLR1 | |
| SCHEMBL6956454 | 0.91 | GP6 (0.41) | GP6AGTR1AGTR2CMKLR1 | |
| SCHEMBL6957300 | 0.85 | HSD11B1 (0.47) | AGTR1AGTR2HSD11B1 | |
| SCHEMBL6949197 | 0.85 | HSD11B1 (0.47) | AGTR1AGTR2HSD11B1 | |
| SCHEMBL6955372 | 0.84 | L3MBTL1 (0.57) | GP6TDP1L3MBTL1 | |
| SCHEMBL6961113 | 0.84 | L3MBTL1 (0.47) | GP6TDP1L3MBTL1 | |
| SCHEMBL6960893 | 0.84 | CA2 (0.35) | GP6AGTR1AGTR2HSD11B1 | |
| SCHEMBL6953051 | 0.84 | HSD11B1 (0.47) | AGTR1AGTR2HSD11B1 | |
| SCHEMBL6956490 | 0.84 | L3MBTL1 (0.59) | GP6TDP1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0711762-B1 | PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS | SUMITOMO CHEMICAL CO (JP) | 2003-08-06 | — | — | EP | disclosed |
| US-6277998-B1 | REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-21 | — | — | US | disclosed |
| US-6191289-B1 | REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-02-20 | — | — | US | disclosed |
| US-5874593-A | SULFUR CONTAINING AMIDE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-02-23 | — | — | US | disclosed |
| EP-0711762-A1 | PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1996-05-15 | — | — | EP | disclosed |