Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSS | P25774 | 3/20 | 0.42 |
| ▸ | CTSK | P43235 | 3/20 | 0.42 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.35 |
| ▸ | IDO1 | P14902 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | GFER | P55789 | 1/20 | 0.35 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.34 |
| ▸ | SPHK2 | Q9NRA0 | 1/20 | 0.33 |
| ▸ | HTR7 | P34969 | 2/20 | 0.33 |
| ▸ | SLC5A1 | P13866 | 2/20 | 0.32 |
| ▸ | BACE1 | P56817 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6952046 | 0.91 | HSD11B1 (0.39) | CTSSCTSKNPC1RAB9ASPHK2 | |
| SCHEMBL6957496 | 0.88 | LPL (0.44) | SPHK2 | |
| SCHEMBL6956763 | 0.88 | LPL (0.44) | SPHK2 | |
| SCHEMBL2056403 | 0.87 | NOTUM (0.47) | CTSSCTSKNOTUMIDO1NISCH | |
| SCHEMBL6963004 | 0.86 | MAOA (0.41) | NPC1RAB9ABACE1 | |
| SCHEMBL8336907 | 0.83 | NOTUM (0.32) | NOTUMIDO1NISCH | |
| SCHEMBL6957851 | 0.83 | IGF1R (0.39) | — | |
| SCHEMBL6952118 | 0.82 | IGF1R (0.38) | MAPT | |
| SCHEMBL6954931 | 0.82 | IGF1R (0.38) | MAPT | |
| SCHEMBL7810819 | 0.81 | CDK8 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0711762-B1 | PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS | SUMITOMO CHEMICAL CO (JP) | 2003-08-06 | — | — | EP | disclosed |
| US-6277998-B1 | REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-21 | — | — | US | disclosed |
| US-6191289-B1 | REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-02-20 | — | — | US | disclosed |
| US-5874593-A | SULFUR CONTAINING AMIDE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-02-23 | — | — | US | disclosed |
| EP-0711762-A1 | PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1996-05-15 | — | — | EP | disclosed |