Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LPL | P06858 | 2/20 | 0.44 |
| ▸ | LIPG | Q9Y5X9 | 2/20 | 0.44 |
| ▸ | SPHK2 | Q9NRA0 | 10/20 | 0.44 |
| ▸ | SPHK1 | Q9NYA1 | 7/20 | 0.42 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.40 |
| ▸ | PPARG | P37231 | 1/20 | 0.39 |
| ▸ | PPARA | Q07869 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6957496 | 1.00 | LPL (0.44) | LPLLIPGSPHK2SPHK1HSD11B1 | |
| SCHEMBL6952046 | 0.94 | HSD11B1 (0.39) | LPLLIPGSPHK2SPHK1HSD11B1 | |
| SCHEMBL6954931 | 0.89 | IGF1R (0.38) | HSD11B1 | |
| SCHEMBL6952118 | 0.89 | IGF1R (0.38) | HSD11B1 | |
| SCHEMBL6961992 | 0.88 | CTSS (0.42) | SPHK2 | |
| SCHEMBL6957851 | 0.87 | IGF1R (0.39) | HSD11B1 | |
| SCHEMBL3822509 | 0.84 | SPHK2 (0.31) | SPHK2 | |
| SCHEMBL5438306 | 0.84 | SPHK2 (0.32) | SPHK2SPHK1PPARA | |
| SCHEMBL6952885 | 0.82 | RAB9A (0.49) | LPLLIPGHSD11B1 | |
| SCHEMBL6957211 | 0.82 | RAB9A (0.49) | LPLLIPGHSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0711762-B1 | PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS | SUMITOMO CHEMICAL CO (JP) | 2003-08-06 | — | — | EP | disclosed |
| US-6277998-B1 | REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-21 | — | — | US | disclosed |
| US-6191289-B1 | REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-02-20 | — | — | US | disclosed |
| US-5874593-A | SULFUR CONTAINING AMIDE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-02-23 | — | — | US | disclosed |
| EP-0711762-A1 | PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1996-05-15 | — | — | EP | disclosed |