SCHEMBL699512

SCHEMBL699512

ClC(Cl)(Cl)c1nc(-c2ccc(/C=C/c3ccccc3)cc2)nc(C(Cl)(Cl)Cl)n1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.44
NPC1 O15118 2/20 0.42
RAB9A P51151 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
TDP1 Q9NUW8 2/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
CASP3 P42574 2/20 0.41
SENP8 Q96LD8 2/20 0.41
SENP7 Q9BQF6 2/20 0.41
CYP1A2 P05177 1/20 0.41
MAPT P10636 1/20 0.41
CYP2C19 P33261 1/20 0.41
RELA Q04206 2/20 0.39
NFE2L2 Q16236 1/20 0.38
CYP19A1 P11511 1/20 0.38
MAOA P21397 1/20 0.38
MAOB P27338 1/20 0.38
SENP6 Q9GZR1 1/20 0.38
PDGFRB P09619 1/20 0.38
PDGFRA P16234 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL274751 1.00 KMT2A (0.44) KMT2ANPC1RAB9ASMN1; SMN2TDP1
SCHEMBL8956397 0.95 NPC1 (0.41) KMT2ANPC1RAB9ASMN1; SMN2TDP1
SCHEMBL10226713 0.89 L3MBTL1 (0.47) KMT2ANPC1RAB9ASMN1; SMN2TDP1
SCHEMBL8956230 0.86 KDM4E (0.47) KMT2ANPC1RAB9ASMN1; SMN2TDP1
SCHEMBL3191110 0.86 NFE2L2 (0.48) KMT2ANPC1RAB9AL3MBTL1CASP3
SCHEMBL9472737 0.85 CASP3 (0.42) KMT2ANPC1RAB9ASMN1; SMN2TDP1
SCHEMBL27967935 0.85 NPC1 (0.43) KMT2ANPC1RAB9ASMN1; SMN2TDP1
SCHEMBL8956496 0.85 APP (0.40) KMT2ANPC1RAB9ASMN1; SMN2TDP1
SCHEMBL8956226 0.85 MAPT (0.43) NPC1RAB9ASMN1; SMN2TDP1CYP1A2
SCHEMBL8956292 0.84 NPC1 (0.44) KMT2ANPC1RAB9ASMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2151606-A None JP disclosed
CN-111983891-B Structure for quantum dot barrier rib and preparation method thereof 杜邦特种材料韩国有限公司 2025-05-30 CN disclosed
CN-118240154-A Curable composition and film made therefrom 罗门哈斯电子材料韩国有限公司 2024-06-25 CN disclosed
CN-118244576-A Photosensitive resin composition and cured film thereof 罗门哈斯电子材料韩国有限公司 2024-06-25 CN disclosed
CN-118244582-A Negative photosensitive resin composition and cured film thereof 罗门哈斯电子材料韩国有限公司 2024-06-25 CN disclosed
CN-117908324-A Negative photosensitive resin composition for high refractive index patterning 罗门哈斯电子材料韩国有限公司 2024-04-19 CN disclosed
US-11493847-B2 Structure for a quantum dot barrier rib and process for preparing the same ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. 2022-11-08 US disclosed
CN-114545732-A Colored photosensitive resin composition and multilayer cured film prepared therefrom 罗门哈斯电子材料韩国有限公司 2022-05-27 CN disclosed
US-20200371436-A1 STRUCTURE FOR A QUANTUM DOT BARRIER RIB AND PROCESS FOR PREPARING THE SAME DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2020-11-26 US disclosed
US-20200299236-A1 COLORED PHOTOSENSITIVE RESIN COMPOSITION AND LIGHT SHIELDING SPACER PREPARED THEREFROM ROHM & HAAS ELECT MATERIALS KOREA LTD (KR) 2020-09-24 US disclosed
EP-0775706-A2 Borates photoinitiators from polyboranes Ciba SC Holding AG (CH) 1997-05-28 EP disclosed
EP-0713144-A2 Photosensitive resin composition HOECHST JAPAN LIMITED (JP) 1996-05-22 EP disclosed
US-5198325-A PHOTOPOLYMERIZABLE MIXTURE, COPYING MATERIAL CONTAINING SAME AND PROCESS FOR PRODUCING HIGHLY HEAT-RESISTANT RELIEF STRUCTURES WHEREIN A TRIHALOMETHYL IS THE PHOTOINITIATOR HOECHST AKTIENGESELLSCHAFT (DE) 1993-03-30 US disclosed
US-5171655-A Acrylic esters or amides containing pendant maleimide groups; photoresists; short exposure times using scanning laser rays; workability FUJI PHOTO FILM CO., LTD. (JP) 1992-12-15 US disclosed
US-5068163-A Photosensitive copy material for lithography HOECHST AKTIENGESELLSCHAFT (DE) 1991-11-26 US disclosed
US-4950582-A CONTAINING POLYURETHANE CONTAINING N-AMINOSULFONYLAMIDO GROUP FUJI PHOTO FILM CO., LTD. (JP) 1990-08-21 US disclosed
US-4946760-A MIXTURE OF PHOTOSENSITIVE ACID PRODUCING COMPOUND AND POLYMER HOECHST AKTIENGESELLSCHAFT (DE) 1990-08-07 US disclosed
JP-H02151606-A PHOTOPOLYMERIZABLE MIXTURE AND RECORDING MATERIAL MANUFACTURED FROM IT HOECHST AG 1990-06-11 JP disclosed
US-4877711-A DURABLE PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 1989-10-31 US disclosed
US-4772534-A PHOTORESISTS FUJI PHOTO FILM CO., LTD. (JP) 1988-09-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200299236-A1 COLORED PHOTOSENSITIVE RESIN COMPOSITION AND LIGHT SHIELDING SPACER PREPARED THEREFROM SETD7, EED, SETD2 KMT2A 1283/4885NPC1 4645/4885RAB9A 4508/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.