Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 3/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | SMYD3 | Q9H7B4 | 1/20 | 0.32 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.30 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.30 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6838096 | 0.92 | NAAA (0.46) | NAAASMN1; SMN2TSHRGAAMAPT | |
| SCHEMBL701582 | 0.85 | NAAA (0.56) | NAAASMN1; SMN2TSHRGAACYP19A1 | |
| SCHEMBL701258 | 0.84 | NAAA (0.57) | NAAASMN1; SMN2GAACYP19A1ALDH1A1 | |
| SCHEMBL15155531 | 0.77 | NAAA (0.59) | NAAASMN1; SMN2TSHRGAAMAPT | |
| SCHEMBL15155533 | 0.74 | NAAA (0.52) | NAAASMN1; SMN2TSHRGAAMAPT | |
| SCHEMBL31069907 | 0.73 | NAAA (0.64) | NAAASMN1; SMN2TSHRGAAMAPT | |
| SCHEMBL987422 | 0.72 | NAAA (0.38) | NAAASMN1; SMN2GAAMAPTCYP19A1 | |
| SCHEMBL31069918 | 0.71 | NAAA (0.68) | NAAASMN1; SMN2GAAMAPTALDH1A1 | |
| SCHEMBL701605 | 0.71 | NAAA (0.36) | NAAASMN1; SMN2GAAMAPT | |
| SCHEMBL11699623 | 0.71 | CYP1A2 (0.53) | TSHRGAASMYD3ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240045329-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, ANTENNA ELEMENT, SEMICONDUCTOR PACKAGE, AND COMPOUND | TORAY INDUSTRIES, INC. (JP) | 2024-02-08 | — | — | US | disclosed |
| US-9788420-B2 | Substrate and touch panel member using same | TORAY INDUSTRIES, INC. (JP) | 2017-10-10 | — | — | US | disclosed |
| US-9690197-B2 | Negative-type photosensitive white composition for touch panel, touch panel and touch panel production method | TORAY INDUSTRIES, INC. (JP) | 2017-06-27 | — | — | US | disclosed |
| US-9510444-B2 | — | — | 2016-11-29 | — | — | US | disclosed |
| US-9500950-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| US-20160161847-A1 | NEGATIVE-TYPE PHOTOSENSITIVE WHITE COMPOSITION FOR TOUCH PANEL, TOUCH PANEL AND TOUCH PANEL PRODUCTION METHOD | TORAY INDUSTRIES, INC. (JP) | 2016-06-09 | — | — | US | disclosed |
| US-20160062237-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2016-03-03 | — | — | US | disclosed |
| US-20150366055-A1 | SUBSTRATE AND TOUCH PANEL MEMBER USING SAME | TORAY INDUSTRIES, INC. (JP) | 2015-12-17 | — | — | US | disclosed |
| US-9213236-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-12-15 | — | — | US | disclosed |
| US-20150125680-A1 | SUBSTRATE AND TOUCH PANEL MEMBER USING SAME | TORAY INDUSTRIES, INC. (JP) | 2015-05-07 | — | — | US | disclosed |
| US-7897821-B2 | Sulfonium compound | JSR CORPORATION (JP) | 2011-03-01 | — | — | US | disclosed |
| US-20100324329-A1 | COMPOUND | JSR CORPORATION (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |
| US-20100239981-A1 | POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100068650-A1 | POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION | JSR CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR CORPORATION (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20090202945-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |
| US-20070254247-A1 | Radiation-sensitive resin composition | YAMAMOTO MASAFUMI | 2007-11-01 | — | — | US | disclosed |
| US-20040241580-A1 | Radiation-sensitive resin composition | NISHIMURA YUKIO (JP) | 2004-12-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | ASIC1, RER1, RPS10 | NAAA 335/4885SMN1; SMN2 752/4885TSHR 941/4885 |
| US-20100324329-A1 | COMPOUND | AFF2, AFF1, AFF4 | NAAA 2865/4885SMN1; SMN2 1699/4885TSHR 890/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.