Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 2/20 | 0.50 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.39 |
| ▸ | CYP19A1 | P11511 | 3/20 | 0.37 |
| ▸ | CD81 | P60033 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | TRPV1 | Q8NER1 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL701583 | 0.98 | NAAA (0.49) | NAAAHTTCYP2C19SMN1; SMN2EPHX1 | |
| SCHEMBL6838099 | 0.92 | NAAA (0.40) | NAAAHTTSMN1; SMN2CYP19A1CD81 | |
| SCHEMBL701605 | 0.86 | NAAA (0.36) | NAAASMN1; SMN2CD81MAPT | |
| SCHEMBL8735156 | 0.78 | EPHX1 (0.54) | NAAAHTTSMN1; SMN2EPHX1CD81 | |
| SCHEMBL720062 | 0.78 | CD81 (0.37) | NAAAHTTEPHX1CD81KDM4E | |
| SCHEMBL2048685 | 0.76 | NAAA (0.54) | NAAAHTTCYP2C19SMN1; SMN2EPHX1 | |
| SCHEMBL31069913 | 0.75 | NAAA (0.66) | NAAAHTTCYP2C19SMN1; SMN2EPHX1 | |
| SCHEMBL7568980 | 0.75 | NAAA (0.66) | NAAAHTTCYP2C19SMN1; SMN2EPHX1 | |
| SCHEMBL258780 | 0.75 | NAAA (0.66) | NAAAHTTCYP2C19SMN1; SMN2EPHX1 | |
| Acetic Acid SCHEMBL17748839 | 0.75 | NAAA (0.67) | NAAAHTTCYP2C19SMN1; SMN2EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240045329-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, ANTENNA ELEMENT, SEMICONDUCTOR PACKAGE, AND COMPOUND | TORAY INDUSTRIES, INC. (JP) | 2024-02-08 | — | — | US | disclosed |
| US-9788420-B2 | Substrate and touch panel member using same | TORAY INDUSTRIES, INC. (JP) | 2017-10-10 | — | — | US | disclosed |
| US-9690197-B2 | Negative-type photosensitive white composition for touch panel, touch panel and touch panel production method | TORAY INDUSTRIES, INC. (JP) | 2017-06-27 | — | — | US | disclosed |
| US-9510444-B2 | — | — | 2016-11-29 | — | — | US | disclosed |
| US-9500950-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| US-20160161847-A1 | NEGATIVE-TYPE PHOTOSENSITIVE WHITE COMPOSITION FOR TOUCH PANEL, TOUCH PANEL AND TOUCH PANEL PRODUCTION METHOD | TORAY INDUSTRIES, INC. (JP) | 2016-06-09 | — | — | US | disclosed |
| US-20160062237-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2016-03-03 | — | — | US | disclosed |
| US-20150366055-A1 | SUBSTRATE AND TOUCH PANEL MEMBER USING SAME | TORAY INDUSTRIES, INC. (JP) | 2015-12-17 | — | — | US | disclosed |
| US-9213236-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-12-15 | — | — | US | disclosed |
| US-20150125680-A1 | SUBSTRATE AND TOUCH PANEL MEMBER USING SAME | TORAY INDUSTRIES, INC. (JP) | 2015-05-07 | — | — | US | disclosed |
| US-7897821-B2 | Sulfonium compound | JSR CORPORATION (JP) | 2011-03-01 | — | — | US | disclosed |
| US-20100324329-A1 | COMPOUND | JSR CORPORATION (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |
| US-20100239981-A1 | POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100068650-A1 | POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION | JSR CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR CORPORATION (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20090202945-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |
| US-20070254247-A1 | Radiation-sensitive resin composition | YAMAMOTO MASAFUMI | 2007-11-01 | — | — | US | disclosed |
| US-20040241580-A1 | Radiation-sensitive resin composition | NISHIMURA YUKIO (JP) | 2004-12-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | ASIC1, RER1, RPS10 | NAAA 335/4885HTT 1834/4885CYP2C19 3693/4885 |
| US-20100324329-A1 | COMPOUND | AFF2, AFF1, AFF4 | NAAA 2865/4885HTT 4624/4885CYP2C19 1478/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.