SCHEMBL701583

SCHEMBL701583

CC(=CCCC(=O)OC1CCCC1)C(=O)O

nearest known ligand 0.49

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 2/20 0.49
SMN1; SMN2 Q16637 1/20 0.41
HTT P42858 1/20 0.40
CYP2C19 P33261 1/20 0.38
EPHX1 P07099 2/20 0.37
CD81 P60033 2/20 0.36
CYP19A1 P11511 2/20 0.36
ALDH1A1 P00352 2/20 0.33
TSHR P16473 1/20 0.33
LMNA P02545 2/20 0.33
KDM4E B2RXH2 1/20 0.33
HPGD P15428 1/20 0.33
PPARG P37231 1/20 0.33
BACE1 P56817 1/20 0.32
GAA P10253 1/20 0.32
MAPT P10636 1/20 0.32
TRPV1 Q8NER1 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL701259 0.98 NAAA (0.50) NAAASMN1; SMN2HTTCYP2C19EPHX1
SCHEMBL6838099 0.93 NAAA (0.40) NAAASMN1; SMN2HTTCD81CYP19A1
SCHEMBL701605 0.88 NAAA (0.36) NAAASMN1; SMN2CD81PPARGBACE1
SCHEMBL8735156 0.76 EPHX1 (0.54) NAAASMN1; SMN2HTTEPHX1CD81
SCHEMBL720062 0.75 CD81 (0.37) NAAAHTTEPHX1CD81KDM4E
SCHEMBL207015 0.74 NAAA (0.64) NAAASMN1; SMN2HTTCYP2C19EPHX1
SCHEMBL2048685 0.74 NAAA (0.54) NAAASMN1; SMN2HTTCYP2C19EPHX1
Acetic Acid SCHEMBL17748839 0.73 NAAA (0.67) NAAASMN1; SMN2HTTCYP2C19EPHX1
SCHEMBL1378849 0.73 NAAA (0.53) NAAASMN1; SMN2HTTCYP2C19EPHX1
SCHEMBL258780 0.72 NAAA (0.66) NAAASMN1; SMN2HTTCYP2C19EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240045329-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, ANTENNA ELEMENT, SEMICONDUCTOR PACKAGE, AND COMPOUND TORAY INDUSTRIES, INC. (JP) 2024-02-08 US disclosed
US-9788420-B2 Substrate and touch panel member using same TORAY INDUSTRIES, INC. (JP) 2017-10-10 US disclosed
US-9690197-B2 Negative-type photosensitive white composition for touch panel, touch panel and touch panel production method TORAY INDUSTRIES, INC. (JP) 2017-06-27 US disclosed
US-9510444-B2 2016-11-29 US disclosed
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-20160161847-A1 NEGATIVE-TYPE PHOTOSENSITIVE WHITE COMPOSITION FOR TOUCH PANEL, TOUCH PANEL AND TOUCH PANEL PRODUCTION METHOD TORAY INDUSTRIES, INC. (JP) 2016-06-09 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-20150366055-A1 SUBSTRATE AND TOUCH PANEL MEMBER USING SAME TORAY INDUSTRIES, INC. (JP) 2015-12-17 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-20150125680-A1 SUBSTRATE AND TOUCH PANEL MEMBER USING SAME TORAY INDUSTRIES, INC. (JP) 2015-05-07 US disclosed
US-20110212401-A1 RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD JSR CORPORATION (JP) 2011-09-01 US disclosed
US-20110151378-A1 RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2011-06-23 US disclosed
US-7956142-B2 Polymerizable sulfonic acid onium salt and resin JSR CORPORATION (JP) 2011-06-07 US disclosed
US-20100285405-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-11-11 US disclosed
US-20100239981-A1 POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-09-23 US disclosed
US-20100221664-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-09-02 US disclosed
US-20100068650-A1 POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION JSR CORPORATION (JP) 2010-03-18 US disclosed
US-20100063232-A1 POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN JSR CORPORATION (JP) 2010-03-11 US disclosed
US-20070254247-A1 Radiation-sensitive resin composition YAMAMOTO MASAFUMI 2007-11-01 US disclosed
US-20040241580-A1 Radiation-sensitive resin composition NISHIMURA YUKIO (JP) 2004-12-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100063232-A1 POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN ASIC1, RER1, RPS10 NAAA 335/4885SMN1; SMN2 752/4885HTT 1834/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.