Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | DGAT1 | O75907 | 1/20 | 0.32 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.32 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28751471 | 0.98 | NPSR1 (0.36) | NPSR1DGAT1CYP4F2CYP4A11 | |
| SCHEMBL16067775 | 0.97 | NPSR1 (0.33) | NPSR1DGAT1 | |
| SCHEMBL3779012 | 0.93 | DGAT1 (0.34) | NPSR1DGAT1 | |
| SCHEMBL15218842 | 0.87 | CTSD (0.36) | DGAT1 | |
| SCHEMBL24629871 | 0.83 | USP2 (0.34) | DGAT1 | |
| SCHEMBL25178779 | 0.83 | CTSD (0.31) | — | |
| SCHEMBL32687892 | 0.83 | NPSR1 (0.34) | NPSR1DGAT1 | |
| SCHEMBL15218843 | 0.81 | USP2 (0.34) | — | |
| SCHEMBL4397311 | 0.81 | CTSD (0.30) | — | |
| SCHEMBL30049388 | 0.81 | CTSD (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| EP-4374877-A2 | PHARMACEUTICAL CONTAINING SODIUM-DEPENDENT PHOSPHATE TRANSPORTER INHIBITOR AND PHOSPHORUS ADSORBENT FOR USE IN THE PREVENTION, TREATMENT OR SUPPRESSION OF CHRONIC KIDNEY DISEASE, ARTERIOSCLEROSIS ASSOCIATED WITH VASCULAR CALCIFICATION, OR ECTOPIC CALCIFICATION. | CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) | 2024-05-29 | — | — | EP | disclosed |
| EP-3928779-B1 | PHARMACEUTICAL CONTAINING SODIUM-DEPENDENT PHOSPHATE TRANSPORTER INHIBITOR AND PHOSPHORUS ADSORBENT FOR USE IN THE PREVENTION, TREATMENT OR SUPPRESSION OF CHRONIC KIDNEY DISEASE, ARTERIOSCLEROSIS ASSOCIATED WITH VASCULAR CALCIFICATION, OR ECTOPIC CALCIFICATION. | CHUGAI PHARMACEUTICAL CO LTD (JP) | 2024-03-06 | — | — | EP | disclosed |
| US-20240027908-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027908-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11687001-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-06-27 | — | — | US | disclosed |
| US-11687001-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-06-27 | — | — | US | disclosed |
| US-20130225593-A1 | DIHYDROPTERIDINONES II | BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) | 2013-08-29 | — | — | US | disclosed |
| US-7348425-B2 | Inhibitors of HCV replication | BRISTOL-MYERS SQUIBB COMPANY (US) | 2008-03-25 | — | — | US | disclosed |
| EP-0739886-B1 | Selective thrombin inhibitors | LG CHEMICAL LTD (KR) | 2003-10-01 | — | — | EP | disclosed |
| CN-1103333-C | Selective thrombin inhibitors | LG CHEMICAL LTD (KR) | 2003-03-19 | — | — | CN | disclosed |
| US-5985899-A | ANTICOAGULANTS | LG CHEMICAL LTD. (KR) | 1999-11-16 | — | — | US | disclosed |
| US-5977114-A | Selective thrombin inhibitors | LG CHEMICAL LTD. (KR) | 1999-11-02 | — | — | US | disclosed |
| CN-1183766-A | Selective thrombin inhibitors | LG CHEMICAL LTD (KR) | 1998-06-03 | — | — | CN | disclosed |
| US-5747535-A | AMIDINOPHENYL COMPOUNDS | LG CHEMICAL LTD. (KR) | 1998-05-05 | — | — | US | disclosed |
| WO-1997049673-A1 | SELECTIVE THROMBIN INHIBITORS | LG CHEMICAL LTD. (KR) | 1997-12-31 | — | — | WO | disclosed |
| EP-0739886-A2 | Selective thrombin inhibitors | LG Chemical Limited (KR) | 1996-10-30 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, TERB1, TRRAP | NPSR1 3193/4885DGAT1 1324/4885CYP4F2 4820/4885 |
| US-11687001-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, TERB1, TRRAP | NPSR1 3193/4885DGAT1 1324/4885CYP4F2 4820/4885 |
| US-20130225593-A1 | DIHYDROPTERIDINONES II | BACE1, BACE2, APP | NPSR1 1297/4885DGAT1 1908/4885CYP4F2 2464/4885 |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, COL1A1, RAD51 | NPSR1 2926/4885DGAT1 2362/4885CYP4F2 4133/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.