Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.63 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylene Glycol SCHEMBL356222 | 0.92 | LMNA (0.75) | LMNAALDH1A1THRB | |
| Ether SCHEMBL491351 | 0.89 | LMNA (0.80) | LMNAALDH1A1THRB | |
| Propylene Glycol SCHEMBL10380801 | 0.85 | LMNA (0.57) | LMNAALDH1A1THRB | |
| Ethylene Glycol SCHEMBL9004515 | 0.84 | LMNA (0.63) | LMNAALDH1A1THRB | |
| Propanol SCHEMBL8131034 | 0.83 | LMNA (0.71) | LMNAALDH1A1THRB | |
| Alcohol SCHEMBL1490179 | 0.83 | LMNA (0.80) | LMNAALDH1A1THRB | |
| Di(Hydroxyethyl)Ether SCHEMBL10711395 | 0.82 | LMNA (0.60) | LMNAALDH1A1THRB | |
| Acetone SCHEMBL16666366 | 0.82 | LMNA (0.60) | LMNAALDH1A1THRB | |
| Diethylene Glycol Monoethyl Ether SCHEMBL2952919 | 0.81 | ALDH1A1 (0.61) | LMNAALDH1A1THRB | |
| 1,3-Propanediol SCHEMBL4129045 | 0.81 | LMNA (0.67) | LMNAALDH1A1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6107202-A | FORMING METAL PATTERN ON SEMICONDUCTOR STRUCTURE, FORMING PASSIVATION LAYER OVER METAL PATTERN AND FORMING A KEYHOLE IN PASSIVATION LAYER, APPLYING, EXPOSING AND DEVELOPING A PHOTORESIST PATTERN, ETCHING SAID PASSIVATION LAYER, STRIPPING | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY (TW) | 2000-08-22 | — | — | US | claimed |
| WO-1990000579-A1 | STRIPPING COMPOSITION USING N-CYCLOHEXYL-2-PYRROLIDONE | ADVANCED CHEMICAL SYSTEMS INTERNATIONAL CORPORATION (US) | 1990-01-25 | — | — | WO | claimed |
| JP-60081159-A | — | — | None | — | — | JP | disclosed |
| US-20210214367-A1 | PROCESS FOR PREPARING BICYCLIC GUANIDINES | WACKER CHEMIE AG (DE) | 2021-07-15 | — | — | US | disclosed |
| CN-112638913-A | Process for preparing bicyclic guanidines | 瓦克化学股份公司 | 2021-04-09 | — | — | CN | disclosed |
| EP-3774807-A1 | PROCESS FOR PREPARING BICYCLIC GUANIDINES | Wacker Chemie AG (DE) | 2021-02-17 | — | — | EP | disclosed |
| CN-102686573-B | Fluorinated oxa or thia heteroarylalkylsulfide derivatives for combating invertebrate pests | MERIAL LTD | 2015-03-11 | — | — | CN | disclosed |
| CN-102307478-A | Pesticidal mixtures | BASF SE | 2012-01-04 | — | — | CN | disclosed |
| EP-0846984-B1 | Prebaking process for facilitating removal of positive photoresist with stripping solutions | EKC TECHNOLOGY INC (US) | 2003-01-29 | — | — | EP | disclosed |
| US-6107202-A | FORMING METAL PATTERN ON SEMICONDUCTOR STRUCTURE, FORMING PASSIVATION LAYER OVER METAL PATTERN AND FORMING A KEYHOLE IN PASSIVATION LAYER, APPLYING, EXPOSING AND DEVELOPING A PHOTORESIST PATTERN, ETCHING SAID PASSIVATION LAYER, STRIPPING | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY (TW) | 2000-08-22 | — | — | US | disclosed |
| CN-1046275-C | 2-methoxyiminophenyl-N-methylacetamide derivatives, process for their preparation, their use and compositions containing them | BASF AG (DE) | 1999-11-10 | — | — | CN | disclosed |
| CN-1141048-A | Process for producing stabilized oxymethylene copolymer | ASAHI CHEMICAL IND (JP) | 1997-01-22 | — | — | CN | disclosed |
| CN-1118165-A | Ortho-substituted 2-methoxyiminophenylacetic acid methylamides | BASF AG (DE) | 1996-03-06 | — | — | CN | disclosed |
| US-5399464-A | Triamine positive photoresist stripping composition and post-ion implantation baking | EKC TECHNOLOGY, INC. (US) | 1995-03-21 | — | — | US | disclosed |
| US-4824763-A | WITH DIMETHYLFORMAMIDE OR N-METHYL PYRROLIDONE AS SOLVENT; REMOVAL AFTER DOPING WAFERS THROUGH PHOTORESIST LAYER; SEMICONDUCTORS | EKC TECHNOLOGY, INC. (US) | 1989-04-25 | — | — | US | disclosed |
| EP-0301756-A2 | Triamine positive photoresist stripping composition and prebaking process | EKC TECHNOLOGY, INC. (US) | 1989-02-01 | — | — | EP | disclosed |
| US-4659861-A | HYDRAULIC PRESSURE TRANSMISSION FLUIDS | THE DOW CHEMICAL COMPANY (US) | 1987-04-21 | — | — | US | disclosed |
| US-4659861-A | HYDRAULIC PRESSURE TRANSMISSION FLUIDS | THE DOW CHEMICAL COMPANY (US) | 1987-04-21 | — | — | US | disclosed |
| US-4659861-A | HYDRAULIC PRESSURE TRANSMISSION FLUIDS | THE DOW CHEMICAL COMPANY (US) | 1987-04-21 | — | — | US | disclosed |
| JP-S6081159-A | NITRILE FUNCTIONAL GLYCOL ETHER ACETAL | RICHIYAADO GOODON UOOTAAMAN | 1985-05-09 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210214367-A1 | PROCESS FOR PREPARING BICYCLIC GUANIDINES | SMOX, CYP4X1, CDY1; CDY1B | LMNA 333/4885ALDH1A1 2427/4885THRB 3254/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.