Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | THRB | P10828 | 2/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | FDPS | P14324 | 1/20 | 0.31 |
| ▸ | CES1 | P23141 | 1/20 | 0.30 |
| ▸ | THRA | P10827 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5856021 | 0.94 | TSHR (0.50) | TSHRALDH1A1THRBFDPSTHRA | |
| SCHEMBL28769247 | 0.93 | TSHR (0.53) | TSHRFDPSMEN1MAPTKMT2A | |
| SCHEMBL10447459 | 0.93 | TSHR (0.53) | TSHRFDPSMEN1MAPTKMT2A | |
| SCHEMBL28232252 | 0.93 | TSHR (0.53) | TSHRFDPSMEN1MAPTKMT2A | |
| SCHEMBL7706303 | 0.90 | ALDH1A1 (0.41) | TSHRALDH1A1THRBGAA | |
| SCHEMBL7701340 | 0.90 | ALDH1A1 (0.41) | TSHRALDH1A1THRBGAA | |
| SCHEMBL441489 | 0.88 | TSHR (0.41) | TSHRALDH1A1THRBGAA | |
| SCHEMBL7701376 | 0.88 | TSHR (0.41) | TSHRALDH1A1THRBGAA | |
| SCHEMBL7706289 | 0.88 | TSHR (0.41) | TSHRALDH1A1THRBGAA | |
| SCHEMBL7709308 | 0.88 | TSHR (0.41) | TSHRALDH1A1THRBGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-1993023773-A1 | PROCESS FOR PREPARATION OF OXYGEN PERMEABLE POLYMER MATERIAL | CIBA-GEIGY AG (CH) | 1993-11-25 | — | — | WO | claimed |
| EP-4560309-A1 | SEQUENCE ANALYZING METHOD, SEQUENCE ANALYZING DEVICE, POLYMERIZATION CONDITION PROPOSING DEVICE, AND AUTOMATIC SYNTHESIZING DEVICE | National Institute for Materials Science (JP) | 2025-05-28 | — | — | EP | disclosed |
| WO-2025033010-A1 | COMPOSITION ESTIMATION METHOD, COMPOSITION ESTIMATION DEVICE, PROGRAM, SAMPLE CONTAINER, AND THERMOGRAVIMETRY/MASS SPECTROMETRY METHOD | 国立研究開発法人物質・材料研究機構 | 2025-02-13 | — | — | WO | disclosed |
| WO-2024018725-A1 | SEQUENCE ANALYZING METHOD, SEQUENCE ANALYZING DEVICE, POLYMERIZATION CONDITION PROPOSING DEVICE, AND AUTOMATIC SYNTHESIZING DEVICE | 国立研究開発法人物質・材料研究機構 | 2024-01-25 | — | — | WO | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| CN-112980543-B | High viscosity index comb polymer viscosity modifiers and methods of using the same to alter lubricant viscosity | 英菲诺姆国际有限公司 | 2023-12-19 | — | — | CN | disclosed |
| CN-112980549-B | High viscosity index comb polymer viscosity modifiers and methods of using the same to alter lubricant viscosity | 英菲诺姆国际有限公司 | 2023-12-15 | — | — | CN | disclosed |
| US-11809077-B2 | Photoresist compositions and pattern formation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-07 | — | — | US | disclosed |
| EP-3839018-B1 | HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME | INFINEUM INT LTD (GB) | 2023-10-18 | — | — | EP | disclosed |
| US-20230314934-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-10-05 | — | — | US | disclosed |
| US-20080241743-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080096134-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-04-24 | — | — | US | disclosed |
| US-20080081289-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20080050675-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-02-28 | — | — | US | disclosed |
| US-20080026317-A1 | Method for using compositions containing fluorocarbinols in lithographic processes | INTERNATIONAL BUSINESS MACHINES CO | 2008-01-31 | — | — | US | disclosed |
| US-20070218406-A1 | Acid generator; exposure to actinic radiation | FUJIFILM CORPORATION (JP) | 2007-09-20 | — | — | US | disclosed |
| US-20070218407-A1 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2007-09-20 | — | — | US | disclosed |
| EP-1558654-A4 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-04-05 | — | — | EP | disclosed |
| EP-1558654-A2 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | Fujifilm Electronic Materials USA, Inc. (US) | 2005-08-03 | — | — | EP | disclosed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | CRY1, CCNT1, CCNA1 | TSHR 3135/4885ALDH1A1 382/4885THRB 3729/4885 |
| US-20230314934-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | CRY1, CBR3, C1S | TSHR 1483/4885ALDH1A1 810/4885THRB 2490/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.