SCHEMBL703093

SCHEMBL703093

c1ccc(O[SiH2]C(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.38

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
SCN4A P35499 2/20 0.38
TSHR P16473 2/20 0.38
LTA4H P09960 1/20 0.38
DPP4 P27487 2/20 0.35
F2 P00734 1/20 0.35
CA4 P22748 1/20 0.35
L3MBTL1 Q9Y468 2/20 0.32
ATM Q13315 1/20 0.32
SLC6A4 P31645 1/20 0.32
KDM4E B2RXH2 1/20 0.32
KCNA3 P22001 1/20 0.32
HTR2A P28223 1/20 0.32
TAAR1 Q96RJ0 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22189252 0.86
SCHEMBL433140 0.77 DPP4 (0.39) TSHRDPP4F2SLC6A4HTR2A
SCHEMBL5135542 0.77 SCN4A (0.32) SCN4ATSHRLTA4HKDM4E
SCHEMBL704150 0.73 KMT2A (0.40) TSHRDPP4F2CA4L3MBTL1
SCHEMBL705070 0.73 CA4 (0.42) TSHRLTA4HCA4KDM4EKCNA3
SCHEMBL587674 0.73 DPP4 (0.36) TSHRDPP4F2HTR2ATAAR1
SCHEMBL17865441 0.71 DPP4 (0.35) TSHRDPP4F2SLC6A4HTR2A
SCHEMBL705271 0.70 TAAR1 (0.37) TSHRDPP4L3MBTL1KDM4ETAAR1
SCHEMBL8381565 0.69 DPP4 (0.41) TSHRDPP4F2L3MBTL1SLC6A4
SCHEMBL10570045 0.68 LTA4H (0.42) TSHRLTA4HCA4L3MBTL1KCNA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110088148-B 1,3, 7-octatriene polymer, hydrogenated product thereof, and method for producing the polymer 株式会社可乐丽 2022-05-10 CN disclosed
US-9546237-B2 Stabilization of polymers that contain a hydrolyzable functionality BRIDGESTONE CORPORATION (JP) 2017-01-17 US disclosed
US-20130331520-A1 STABILIZATION OF POLYMERS THAT CONTAIN A HYDROLYZABLE FUNCTIONALITY BRIDGESTONE CORPORATION (JP) 2013-12-12 US disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
CN-100535054-C Silica film forming material, silica film and preparation method thereof FUJITSU LTD (JP) 2009-09-02 CN disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
CN-1891757-A Silica film forming material, silica film and method of manufacturing the same FUJITSU LTD (JP) 2007-01-10 CN disclosed