⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL706289 | 0.83 | — | — | |
| SCHEMBL27646914 | 0.81 | DNM1 (0.35) | — | |
| SCHEMBL31010235 | 0.79 | HSD17B10 (0.31) | — | |
| SCHEMBL28044245 | 0.78 | — | — | |
| SCHEMBL703913 | 0.75 | — | — | |
| SCHEMBL28729679 | 0.74 | — | — | |
| SCHEMBL6423714 | 0.74 | — | — | |
| SCHEMBL23093221 | 0.74 | HSD17B10 (0.30) | — | |
| SCHEMBL6653509 | 0.72 | ALDH1A1 (0.33) | — | |
| SCHEMBL3482252 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108688415-A | Cavity Noise reduction tire | 韩国轮胎株式会社 | 2018-10-23 | — | — | CN | disclosed |
| CN-108068561-A | Cavity Noise reduction tire | 韩国轮胎株式会社 | 2018-05-25 | — | — | CN | disclosed |
| CN-103185905-B | Antireflection film and optical element | TOTATSU CORP. (JP) | 2015-12-23 | — | — | CN | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |