⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27646914 | 0.92 | DNM1 (0.35) | — | |
| SCHEMBL703114 | 0.83 | — | — | |
| SCHEMBL27626704 | 0.80 | ADRB2 (0.35) | — | |
| SCHEMBL6653509 | 0.78 | ALDH1A1 (0.33) | — | |
| SCHEMBL23093205 | 0.77 | ADRB2 (0.36) | — | |
| SCHEMBL10348469 | 0.77 | — | — | |
| SCHEMBL29240703 | 0.77 | — | — | |
| SCHEMBL705012 | 0.75 | ADRB2 (0.35) | — | |
| SCHEMBL23093136 | 0.75 | ADRB2 (0.35) | — | |
| SCHEMBL27907010 | 0.72 | DNM1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115215729-B | Preparation method of polyester-grade coal-based ethylene glycol | 中国石油化工股份有限公司 | 2024-07-02 | — | — | CN | disclosed |
| CN-115216342-B | Preparation method of polyester-grade coal-based ethylene glycol | 中国石油化工股份有限公司 | 2023-09-01 | — | — | CN | disclosed |
| CN-115215729-A | Preparation method of polyester-grade coal-based ethylene glycol | 中国石油化工股份有限公司 | 2022-10-21 | — | — | CN | disclosed |
| CN-115216342-A | Preparation method of polyester-grade coal-based ethylene glycol | 中国石油化工股份有限公司 | 2022-10-21 | — | — | CN | disclosed |
| CN-108068561-A | Cavity Noise reduction tire | 韩国轮胎株式会社 | 2018-05-25 | — | — | CN | disclosed |
| CN-103185905-B | Antireflection film and optical element | TOTATSU CORP. (JP) | 2015-12-23 | — | — | CN | disclosed |
| CN-103185905-A | Anti-reflection film and optical element | TAMRON KK | 2013-07-03 | — | — | CN | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| CN-101472959-A | Ziegler-Natta catalyst with in situ-generated donor | NOVOLEN TECH HOLDINGS CV (NL) | 2009-07-01 | — | — | CN | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| CN-1739190-A | Fluorine-free plasma curing method for porous Low-K material | AXCELIS TECH INC (US) | 2006-02-22 | — | — | CN | disclosed |