SCHEMBL703255

SCHEMBL703255

CC(O[SiH2]CCCC[SiH2]OC(C)(c1ccccc1)c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.40
ALDH1A1 P00352 2/20 0.38
TAAR1 Q96RJ0 1/20 0.38
ALOX15 P16050 1/20 0.38
CYP2C19 P33261 1/20 0.34
HIF1A Q16665 1/20 0.34
CHRM2 P08172 2/20 0.34
KCNN4 O15554 3/20 0.32
ESR1 P03372 2/20 0.32
ESR2 Q92731 2/20 0.32
CYP3A4 P08684 1/20 0.32
HTR1A P08908 1/20 0.32
ADRA2A P08913 1/20 0.32
CHRM1 P11229 1/20 0.32
DRD1 P21728 1/20 0.32
TBXA2R P21731 1/20 0.32
ACHE P22303 1/20 0.32
SLC6A2 P23975 1/20 0.32
SLC6A4 P31645 1/20 0.32
ADRA1A P35348 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704182 0.96 MAPK1 (0.40) MAPK1ALDH1A1TAAR1ALOX15CYP2C19
SCHEMBL704841 0.92 MAPK1 (0.43) MAPK1ALDH1A1TAAR1ALOX15CYP2C19
SCHEMBL705911 0.83 MAPK1 (0.43) MAPK1ALDH1A1TAAR1ALOX15CYP2C19
SCHEMBL4171312 0.79 MAPK1 (0.46) MAPK1ALDH1A1TAAR1ALOX15CYP2C19
SCHEMBL704100 0.78 KCNN4 (0.35) MAPK1ALDH1A1TAAR1ALOX15CHRM2
SCHEMBL10526529 0.76 HCAR2 (0.36) ALDH1A1CHRM2CHRM1
SCHEMBL707444 0.76 LMNA (0.33) MAPK1CYP2C19KCNN4CYP3A4KCNH2
SCHEMBL707299 0.74 KCNN4 (0.35) MAPK1ALDH1A1TAAR1ALOX15CHRM2
SCHEMBL23910519 0.72 MAPK1 (0.44) MAPK1ALDH1A1TAAR1ALOX15CYP2C19
SCHEMBL3894508 0.72 MAPK1 (0.44) MAPK1ALDH1A1TAAR1ALOX15KCNN4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed