Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA4 | P22748 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | LTA4H | P09960 | 2/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | MAOA | P21397 | 2/20 | 0.33 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.33 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.33 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.33 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.33 |
| ▸ | MAOB | P27338 | 1/20 | 0.33 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | HTR2A | P28223 | 3/20 | 0.31 |
| ▸ | CCNE1 | P24864 | 1/20 | 0.30 |
| ▸ | CDK2 | P24941 | 1/20 | 0.30 |
| ▸ | CDK5 | Q00535 | 1/20 | 0.30 |
| ▸ | ESR1 | P03372 | 1/20 | 0.30 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL713039 | 0.96 | CA4 (0.37) | CA4LMNALTA4HTSHRKDM4E | |
| SCHEMBL19816748 | 0.90 | CA4 (0.38) | CA4LMNALTA4HTSHRKDM4E | |
| SCHEMBL19816740 | 0.85 | LTA4H (0.35) | CA4LMNALTA4HMAOAPTGS1 | |
| SCHEMBL712037 | 0.80 | CA4 (0.39) | CA4LMNALTA4HTSHRKDM4E | |
| SCHEMBL704336 | 0.78 | CA4 (0.37) | CA4LMNALTA4HTSHRKDM4E | |
| SCHEMBL301441 | 0.77 | CA4 (0.35) | CA4LMNALTA4HKDM4EPOLB | |
| SCHEMBL705345 | 0.76 | CA4 (0.39) | CA4LMNALTA4HTSHRKDM4E | |
| SCHEMBL705651 | 0.76 | ALDH1A1 (0.33) | TSHRESR1ESR2 | |
| SCHEMBL706142 | 0.75 | CA4 (0.42) | CA4LMNALTA4HTSHRKDM4E | |
| SCHEMBL432208 | 0.75 | CA4 (0.42) | CA4LMNALTA4HTSHRKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11059920-B2 | Process for producing high cis-1,4-polydiene with lanthanide-based catalyst compositions | BRIDGESTONE CORPORATION (JP) | 2021-07-13 | — | — | US | claimed |
| US-20190169330-A1 | Process For Producing High Cis-1,4-Polydiene With Lanthanide-Based Catalyst Compositions | BRIDGESTONE CORPORATION (JP) | 2019-06-06 | — | — | US | claimed |
| EP-3491030-A1 | PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS | Bridgestone Corporation (JP) | 2019-06-05 | — | — | EP | claimed |
| WO-2018022994-A1 | PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS | BRIDGESTONE CORPORATION (JP) | 2018-02-01 | — | — | WO | claimed |
| CN-109715680-B | Process for preparing high cis-1, 4-polydienes with lanthanide-based catalyst compositions | 株式会社普利司通 | 2021-10-19 | — | — | CN | disclosed |
| US-11059920-B2 | Process for producing high cis-1,4-polydiene with lanthanide-based catalyst compositions | BRIDGESTONE CORPORATION (JP) | 2021-07-13 | — | — | US | disclosed |
| EP-3491030-B1 | PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS | BRIDGESTONE CORP (JP) | 2021-03-24 | — | — | EP | disclosed |
| US-20190169330-A1 | Process For Producing High Cis-1,4-Polydiene With Lanthanide-Based Catalyst Compositions | BRIDGESTONE CORPORATION (JP) | 2019-06-06 | — | — | US | disclosed |
| EP-3491030-A1 | PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS | Bridgestone Corporation (JP) | 2019-06-05 | — | — | EP | disclosed |
| WO-2018022994-A1 | PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS | BRIDGESTONE CORPORATION (JP) | 2018-02-01 | — | — | WO | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |