Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | BPTF | Q12830 | 1/20 | 0.36 |
| ▸ | P2RX7 | Q99572 | 2/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | GRM5 | P41594 | 4/20 | 0.33 |
| ▸ | GRM2 | Q14416 | 4/20 | 0.33 |
| ▸ | GRM6 | O15303 | 2/20 | 0.33 |
| ▸ | GRM1 | Q13255 | 2/20 | 0.33 |
| ▸ | GRM4 | Q14833 | 2/20 | 0.33 |
| ▸ | GRM3 | Q14832 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5354981 | 0.85 | ALDH1A1 (0.39) | ALDH1A1BPTFP2RX7SMN1; SMN2CYP3A4 | |
| SCHEMBL704030 | 0.84 | ALDH1A1 (0.50) | ALDH1A1BPTFP2RX7SMN1; SMN2CYP3A4 | |
| SCHEMBL3680659 | 0.74 | GAA (0.53) | ALDH1A1MEN1KMT2A | |
| SCHEMBL19808649 | 0.72 | HSD11B1 (0.36) | ALDH1A1P2RX7SMN1; SMN2GRM5GRM2 | |
| SCHEMBL418818 | 0.70 | KDM4E (0.35) | ALDH1A1BPTFP2RX7SMN1; SMN2 | |
| SCHEMBL1089102 | 0.70 | ALDH1A1 (0.33) | ALDH1A1BPTFP2RX7SMN1; SMN2 | |
| SCHEMBL7965513 | 0.70 | GRM2 (0.40) | CYP2C19GRM5GRM2GRM6GRM1 | |
| SCHEMBL1089318 | 0.69 | POLB (0.46) | ALDH1A1MEN1KMT2A | |
| SCHEMBL2409327 | 0.68 | EPHX2 (0.44) | ALDH1A1BPTFNPSR1GRM2GRM3 | |
| SCHEMBL38655452 | 0.68 | ALDH1A1 (0.50) | ALDH1A1BPTFP2RX7SMN1; SMN2KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040058279-A1 | Pattern formation material, pattern formation method, and exposure mask fabrication method | KABUSHIKI KAISHA TOSHIBA | 2004-03-25 | — | — | US | disclosed |
| US-6660455-B2 | Alkali-soluble resin, photoacid generator, and dissolution inhibiting groups, increasing the sensitivity of the pattern formation material | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-09 | — | — | US | disclosed |
| US-20010026895-A1 | Pattern formation material, pattern formation method, and exposure mask fabrication method | KABUSHIKI KAISHA TOSHIBA | 2001-10-04 | — | — | US | disclosed |