SCHEMBL704206

SCHEMBL704206

Cl[Si](c1ccccc1)(c1ccccc1)c1ccc([Si](Cl)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.40
ESR2 Q92731 1/20 0.40
TSHR P16473 6/20 0.37
TDP1 Q9NUW8 4/20 0.35
ALDH1A1 P00352 3/20 0.35
HSD17B10 Q99714 1/20 0.35
NR1H2 P55055 2/20 0.32
NR1H3 Q13133 2/20 0.32
MAOA P21397 1/20 0.32
MAOB P27338 1/20 0.32
RAB9A P51151 2/20 0.32
BBOX1 O75936 1/20 0.32
EHMT2 Q96KQ7 1/20 0.32
EHMT1 Q9H9B1 1/20 0.32
NPC1 O15118 1/20 0.32
MAPK1 P28482 1/20 0.32
LMNA P02545 2/20 0.32
KDM4E B2RXH2 1/20 0.31
MEN1 O00255 1/20 0.31
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL197123 0.97 TSHR (0.39) ESR1ESR2TSHRTDP1ALDH1A1
SCHEMBL28418551 0.93 TSHR (0.37) ESR1ESR2TSHRTDP1ALDH1A1
SCHEMBL9586411 0.88 TSHR (0.33) ESR1ESR2TSHRTDP1ALDH1A1
SCHEMBL12816296 0.87 LMNA (0.48) ESR1ESR2TSHRTDP1ALDH1A1
SCHEMBL10319120 0.87 ESR1 (0.43) ESR1ESR2NR1H2NR1H3MAPT
SCHEMBL31454149 0.87 ALDH1A1 (0.48) ESR1ESR2TDP1ALDH1A1NR1H2
SCHEMBL12817629 0.87 NFE2L2 (0.41) ESR1ESR2TSHRALDH1A1RAB9A
SCHEMBL15410897 0.87 NFE2L2 (0.41) ESR1ESR2TSHRALDH1A1RAB9A
SCHEMBL3481733 0.87 LMNA (0.48) ESR1ESR2TSHRTDP1ALDH1A1
SCHEMBL12816989 0.85 ALDH1A1 (0.50) ESR2TDP1ALDH1A1HSD17B10RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5318848-A Surface modified with a multi-legged silane-coupling agent SHISEIDO COMPANY LTD. (JP) 1994-06-07 US claimed
EP-0470255-B1 CHROMATOGRAPHIC PACKING AND PREPARATION THEREOF SHISEIDO CO LTD (JP) 1994-06-01 EP claimed
EP-0470255-A1 CHROMATOGRAPHIC PACKING AND PREPARATION THEREOF SHISEIDO COMPANY LIMITED (JP) 1992-02-12 EP claimed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
US-5318848-A Surface modified with a multi-legged silane-coupling agent SHISEIDO COMPANY LTD. (JP) 1994-06-07 US disclosed
EP-0470255-B1 CHROMATOGRAPHIC PACKING AND PREPARATION THEREOF SHISEIDO CO LTD (JP) 1994-06-01 EP disclosed
EP-0470255-A1 CHROMATOGRAPHIC PACKING AND PREPARATION THEREOF SHISEIDO COMPANY LIMITED (JP) 1992-02-12 EP disclosed