Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.47 |
| ▸ | MAOA | P21397 | 1/20 | 0.47 |
| ▸ | SIGMAR1 | Q99720 | 7/20 | 0.46 |
| ▸ | MAOB | P27338 | 2/20 | 0.45 |
| ▸ | IDO1 | P14902 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19470840 | 0.98 | SIGMAR1 (0.48) | L3MBTL1MAOASIGMAR1MAOBTDP1 | |
| SCHEMBL6325312 | 0.98 | SIGMAR1 (0.48) | L3MBTL1MAOASIGMAR1MAOBTDP1 | |
| SCHEMBL3110910 | 0.98 | SIGMAR1 (0.48) | L3MBTL1MAOASIGMAR1MAOBTDP1 | |
| SCHEMBL19470822 | 0.98 | SIGMAR1 (0.48) | L3MBTL1MAOASIGMAR1MAOBTDP1 | |
| SCHEMBL19470846 | 0.98 | SIGMAR1 (0.48) | L3MBTL1MAOASIGMAR1MAOBTDP1 | |
| SCHEMBL19470849 | 0.98 | SIGMAR1 (0.48) | L3MBTL1MAOASIGMAR1MAOBTDP1 | |
| SCHEMBL705764 | 0.94 | IDO1 (0.45) | L3MBTL1MAOASIGMAR1MAOBIDO1 | |
| SCHEMBL296206 | 0.85 | ALDH1A1 (0.42) | IDO1TDP1 | |
| SCHEMBL4129114 | 0.81 | SIGMAR1 (0.59) | SIGMAR1MEN1KMT2A | |
| SCHEMBL17937838 | 0.81 | TAAR1 (0.41) | L3MBTL1SIGMAR1IDO1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240270915-A1 | SILICA-COATED CELLULOSE NANOFIBER MODIFIED WITH HYDROPHOBIC FUNCTIONAL GROUP AND PRESSURE SENSITIVE ADHESIVE COMPRISING THE SAME | KYUNGPOOK NATIONAL UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION (KR) | 2024-08-15 | — | — | US | claimed |
| EP-2216682-B1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST | ADEKA CORP (JP) | 2013-07-17 | — | — | EP | claimed |
| US-20240270915-A1 | SILICA-COATED CELLULOSE NANOFIBER MODIFIED WITH HYDROPHOBIC FUNCTIONAL GROUP AND PRESSURE SENSITIVE ADHESIVE COMPRISING THE SAME | KYUNGPOOK NATIONAL UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION (KR) | 2024-08-15 | — | — | US | disclosed |
| CN-107075255-B | Encapsulating material composition for LED | 日产化学工业株式会社 | 2020-05-22 | — | — | CN | disclosed |
| US-10066059-B2 | Sealing material composition for LED | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-09-04 | — | — | US | disclosed |
| CN-108472598-A | For treatment fluid or the material of fluid mixture | 西拉纳有限公司 | 2018-08-31 | — | — | CN | disclosed |
| US-20170306095-A1 | SEALING MATERIAL COMPOSITION FOR LED | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-10-26 | — | — | US | disclosed |
| CN-106999980-A | Liquid coating composition for use in a method for forming a superhydrophobic, superoleophobic or superamphiphobic layer | 西拉纳有限公司 | 2017-08-01 | — | — | CN | disclosed |
| CN-104011083-B | Use the polymerization of the particle containing surfactant | 住友化学株式会社 | 2016-12-21 | — | — | CN | disclosed |
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-8211619-B2 | Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist | ADEKA CORPORATION (JP) | 2012-07-03 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100273104-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST | A D E K A (ADEKA CORPORATION) (JP) | 2010-10-28 | — | — | US | disclosed |
| EP-2216682-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST | Adeka Corporation (JP) | 2010-08-11 | — | — | EP | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |