Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 1/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | SIGMAR1 | Q99720 | 5/20 | 0.43 |
| ▸ | MAOA | P21397 | 1/20 | 0.43 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.42 |
| ▸ | HTR1A | P08908 | 1/20 | 0.42 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.42 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.42 |
| ▸ | DRD1 | P21728 | 1/20 | 0.42 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.42 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.42 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.42 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.42 |
| ▸ | DRD3 | P35462 | 1/20 | 0.42 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.42 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.42 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.42 |
| ▸ | MAOB | P27338 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL704369 | 0.94 | L3MBTL1 (0.47) | IDO1L3MBTL1MEN1KMT2ASIGMAR1 | |
| SCHEMBL6325312 | 0.92 | SIGMAR1 (0.48) | L3MBTL1SIGMAR1MAOAMAOB | |
| SCHEMBL3110910 | 0.92 | SIGMAR1 (0.48) | L3MBTL1SIGMAR1MAOAMAOB | |
| SCHEMBL19470846 | 0.92 | SIGMAR1 (0.48) | L3MBTL1SIGMAR1MAOAMAOB | |
| SCHEMBL19470822 | 0.92 | SIGMAR1 (0.48) | L3MBTL1SIGMAR1MAOAMAOB | |
| SCHEMBL19470840 | 0.92 | SIGMAR1 (0.48) | L3MBTL1SIGMAR1MAOAMAOB | |
| SCHEMBL19470849 | 0.92 | SIGMAR1 (0.48) | L3MBTL1SIGMAR1MAOAMAOB | |
| SCHEMBL296206 | 0.87 | ALDH1A1 (0.42) | IDO1AOC3HTR2A | |
| SCHEMBL2199847 | 0.82 | CYP1A2 (0.43) | IDO1DRD3KCNH2 | |
| SCHEMBL17937646 | 0.80 | TAAR1 (0.42) | IDO1SIGMAR1CHRM2SLC6A2SLC6A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 182 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250192361-A1 | METHOD FOR PREPARING POLYPROPYLENE FOR SEPARATOR OF SECONDARY BATTERY HAVING EXCELLENT MECHANICAL AND THERMAL PROPERTIES | LOTTE CHEMICAL CORPORATION (KR) | 2025-06-12 | — | — | US | claimed |
| CN-118265730-A | Method for producing polypropylene for secondary battery separator having excellent mechanical properties and thermal characteristics | 乐天化学株式会社 | 2024-06-28 | — | — | CN | claimed |
| EP-2216682-B1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST | ADEKA CORP (JP) | 2013-07-17 | — | — | EP | claimed |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12585188-B2 | Composition for forming resist underlying film | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4679175-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20250377596-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| US-20250362609-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250355357-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-20 | — | — | US | disclosed |
| US-20250348001-A1 | METHOD FOR PRODUCING LAMINATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-13 | — | — | US | disclosed |
| US-20060127563-A1 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2006-06-15 | — | — | US | disclosed |
| US-20060019034-A1 | Process for producing chemical adsorption film and chemical adsorption film | SEIKO EPSON CORPORATION (JP) | 2006-01-26 | — | — | US | disclosed |
| US-20050287392-A1 | Organic electroluminescent device, method for producing the same, and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2005-12-29 | — | — | US | disclosed |
| US-20050192708-A1 | Method for selecting formulations to treat electrical cables | NOVINIUM, INC. (US) | 2005-09-01 | — | — | US | disclosed |
| US-20050189130-A1 | Method for treating electrical cable at sustained elevated pressure | NOVINIUM, INC. (US) | 2005-09-01 | — | — | US | disclosed |
| CN-1036202-C | Polymerization catalyst | MITSUI PETROCHEMICAL IND (JP) | 1997-10-22 | — | — | CN | disclosed |
| CN-1117055-A | Polymerization catalyst | MITSUI PETROCHEMICAL IND (JP) | 1996-02-21 | — | — | CN | disclosed |
| CN-1030990-C | Olefin polymerization process | MITSUI PETROCHEMICAL IND (JP) | 1996-02-14 | — | — | CN | disclosed |
| CN-88101916-A | Olefin polymerization process and catalyst therefor | — | 1988-10-26 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | IDO1 2716/4885L3MBTL1 1431/4885MEN1 2480/4885 |
| US-12585188-B2 | Composition for forming resist underlying film | SRR, SMC1A, ASH2L | IDO1 3095/4885L3MBTL1 809/4885MEN1 1625/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.