SCHEMBL704883

SCHEMBL704883

CC[Si](CC)(CCC[Si](CC)(CC)Oc1ccccc1)Oc1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 4/20 0.38
KCNA3 P22001 1/20 0.38
CA4 P22748 1/20 0.36
RECQL P46063 1/20 0.35
HTR1B P28222 1/20 0.34
L3MBTL1 Q9Y468 2/20 0.33
CHRNB2 P17787 2/20 0.33
CHRNB4 P30926 2/20 0.33
CHRNA3 P32297 2/20 0.33
CHRNA7 P36544 2/20 0.33
CHRNA4 P43681 2/20 0.33
TSHR P16473 1/20 0.33
MLNR O43193 1/20 0.32
NR1I2 O75469 1/20 0.32
ESR1 P03372 1/20 0.32
NR3C1 P04150 1/20 0.32
PGR P06401 1/20 0.32
ADRB2 P07550 1/20 0.32
CHRM2 P08172 1/20 0.32
ADRB1 P08588 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704094 0.96 LTA4H (0.38) LTA4HKCNA3CA4RECQLHTR1B
SCHEMBL705618 0.91 LTA4H (0.39) LTA4HKCNA3CA4RECQLL3MBTL1
SCHEMBL7992033 0.89 LTA4H (0.38) LTA4HKCNA3RECQLHTR1BL3MBTL1
SCHEMBL713108 0.87 CA4 (0.42) LTA4HKCNA3CA4HTR1BL3MBTL1
SCHEMBL706753 0.86 LTA4H (0.41) LTA4HKCNA3CA4RECQLHTR1B
SCHEMBL704864 0.86 LTA4H (0.46) LTA4HKCNA3RECQLTSHRMLNR
SCHEMBL9843707 0.84 ALDH1A1 (0.33) LTA4HKCNA3L3MBTL1TSHR
SCHEMBL706648 0.83 LTA4H (0.47) LTA4HKCNA3CA4RECQLTSHR
SCHEMBL705525 0.83 LTA4H (0.39) LTA4HKCNA3CA4L3MBTL1CHRNB2
SCHEMBL712146 0.82 LTA4H (0.41) LTA4HKCNA3CA4RECQLHTR1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed