Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 4/20 | 0.43 |
| ▸ | CA4 | P22748 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.39 |
| ▸ | CHRNB2 | P17787 | 2/20 | 0.38 |
| ▸ | CHRNB4 | P30926 | 2/20 | 0.38 |
| ▸ | CHRNA3 | P32297 | 2/20 | 0.38 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.38 |
| ▸ | CHRNA4 | P43681 | 2/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL707758 | 0.87 | LTA4H (0.50) | LTA4HCA4LMNATSHRKCNA3 | |
| Hydrochloric Acid SCHEMBL9709369 | 0.84 | LTA4H (0.47) | LTA4HCA4LMNATSHRKCNA3 | |
| SCHEMBL2115179 | 0.81 | LTA4H (0.43) | LTA4HCA4LMNATSHRKCNA3 | |
| Naphthalene SCHEMBL28994860 | 0.79 | CYP2A6 (0.44) | LTA4HCA4TSHRKCNA3 | |
| Biphenyl SCHEMBL2499426 | 0.79 | ALDH1A1 (0.50) | LTA4HCA4TSHRKCNA3 | |
| SCHEMBL2115587 | 0.77 | CA4 (0.50) | LTA4HCA4LMNATSHRKCNA3 | |
| SCHEMBL705351 | 0.76 | LTA4H (0.41) | LTA4HCA4LMNATSHRKCNA3 | |
| Diphenylether SCHEMBL23093711 | 0.76 | LTA4H (0.71) | LTA4HCA4LMNATSHR | |
| SCHEMBL9715684 | 0.76 | LTA4H (0.45) | LTA4HCA4LMNATSHRKCNA3 | |
| SCHEMBL707316 | 0.75 | CA4 (0.42) | LTA4HCA4LMNATSHRKCNA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250382394-A1 | CATALYST SYSTEM FOR POLYMERIZATION OF AN OLEFIN | SABIC GLOBAL TECHNOLOGIES BV (NL) | 2025-12-18 | — | — | US | disclosed |
| EP-4551620-A1 | CATALYST SYSTEM FOR POLYMERIZATION OF AN OLEFIN | SABIC Global Technologies B.V. (NL) | 2025-05-14 | — | — | EP | disclosed |
| US-20250101152-A1 | CATALYST SYSTEM FOR POLYMERIZATION OF AN OLEFIN | SABIC GLOBAL TECHNOLOGIES BV (NL) | 2025-03-27 | — | — | US | disclosed |
| EP-4444769-A1 | CATALYST SYSTEM FOR POLYMERIZATION OF AN OLEFIN | SABIC Global Technologies B.V. (NL) | 2024-10-16 | — | — | EP | disclosed |
| WO-2024080172-A1 | MODIFIED GROUP-CONTAINING HYDROGENATED BLOCK COPOLYMER AND METHOD FOR PRODUCING MODIFIED GROUP-CONTAINING HYDROGENATED BLOCK COPOLYMER | 日本ゼオン株式会社 | 2024-04-18 | — | — | WO | disclosed |
| WO-2024008770-A1 | CATALYST SYSTEM FOR POLYMERIZATION OF AN OLEFIN | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2024-01-11 | — | — | WO | disclosed |
| WO-2023104940-A1 | CATALYST SYSTEM FOR POLYMERIZATION OF AN OLEFIN | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2023-06-15 | — | — | WO | disclosed |
| US-20230167244-A1 | METHOD OF PRODUCING SILICONE POLYMER | TORAY FINE CHEMICALS CO., LTD. (JP) | 2023-06-01 | — | — | US | disclosed |
| EP-4119596-A1 | METHOD FOR PRODUCING SILICONE POLYMER | Toray Fine Chemicals Co., Ltd. (JP) | 2023-01-18 | — | — | EP | disclosed |
| EP-3083822-B1 | HETEROPHASIC PROPYLENE COPOLYMER | SAUDI BASIC IND CORP (SA) | 2021-09-08 | — | — | EP | disclosed |
| US-6824833-B2 | STACKED DIELECTRIC | JSR CORPORATION (JP) | 2004-11-30 | — | — | US | disclosed |
| US-6749944-B2 | VAPOR DEPOSITION, OSCILLATION, HEATING USING ORGANOSILICON COMPOUND; FORMING DIELECTRIC | JSR CORPORATION (JP) | 2004-06-15 | — | — | US | disclosed |
| US-20040013972-A1 | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORPORATION (JP) | 2004-01-22 | — | — | US | disclosed |
| EP-1350814-A1 | RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX | JSR Corporation (JP) | 2003-10-08 | — | — | EP | disclosed |
| US-20030077461-A1 | Stacked film, insulating film and substrate for semiconductor | JSR CORPORATION (JP) | 2003-04-24 | — | — | US | disclosed |
| US-20030064303-A1 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | JSR CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
| EP-1298176-A2 | Stacked film insulating film and substrate for semiconductor | JSR Corporation (JP) | 2003-04-02 | — | — | EP | disclosed |
| US-20030059628-A1 | Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor | JSR CORPORATION (JP) | 2003-03-27 | — | — | US | disclosed |
| EP-1295924-A2 | Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor | JSR Corporation (JP) | 2003-03-26 | — | — | EP | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |