SCHEMBL705955

SCHEMBL705955

CC[Si](Br)(Br)c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.38
PSIP1 O75475 1/20 0.37
MAPT P10636 1/20 0.35
ESR1 P03372 2/20 0.34
ESR2 Q92731 1/20 0.34
ALDH1A1 P00352 4/20 0.32
TDP1 Q9NUW8 3/20 0.32
KDM4E B2RXH2 2/20 0.32
TSHR P16473 2/20 0.32
TRPA1 O75762 1/20 0.32
GAA P10253 1/20 0.31
HPGD P15428 1/20 0.31
LMNA P02545 2/20 0.31
HTR2A P28223 1/20 0.31
HRH1 P35367 1/20 0.31
ALOX12 P18054 1/20 0.30
ACHE P22303 1/20 0.30
ATM Q13315 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL707342 0.86 ESR1 (0.40) ESR1ESR2
SCHEMBL708300 0.80 TP53 (0.35) TP53PSIP1MAPTESR1ESR2
SCHEMBL707095 0.79 TP53 (0.38) TP53PSIP1MAPTESR1ESR2
SCHEMBL706448 0.79 TP53 (0.38) TP53PSIP1MAPTESR1ESR2
SCHEMBL706954 0.78 ALDH1A1 (0.35) MAPTESR1ESR2ALDH1A1TDP1
SCHEMBL704377 0.78 ALDH1A1 (0.35) MAPTESR1ESR2ALDH1A1TDP1
SCHEMBL705289 0.77 TSHR (0.36) TDP1TSHRSMN1; SMN2
SCHEMBL988676 0.75 NR1H2 (0.43) TP53PSIP1MAPTESR1ESR2
SCHEMBL705811 0.74 ALDH1A1 (0.33) MAPTESR1ESR2ALDH1A1TDP1
SCHEMBL708106 0.74 ALDH1A1 (0.33) MAPTESR1ESR2ALDH1A1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3768732-A1 PROCESS FOR FUNCTIONALIZATION OF ORGANO-ZINC COMPOUNDS WITH HALOSILANES USING BASIC NITROGEN CONTAINING HETEROCYCLES AND SILYL-FUNCTIONALIZED COMPOUNDS PREPARED THEREBY Dow Global Technologies LLC (US) 2021-01-27 EP disclosed
EP-3768733-A1 SILICON-TERMINATED TELECHELIC POLYOLEFIN COMPOSITIONS AND PROCESSES FOR PREPARING THE SAME Dow Global Technologies LLC (US) 2021-01-27 EP disclosed
US-20210017195-A1 PROCESS FOR FUNCTIONALIZATION OF ORGANO-ZINC COMPOUNDS WITH HALOSILANES USING BASIC NITROGEN CONTAINING HETEROCYCLES AND SILYL-FUNCTIONALIZED COMPOUNDS PREPARED THEREBY DOW GLOBAL TECHNOLOGIES LLC (US) 2021-01-21 US disclosed
US-20210017311-A1 SILICON-TERMINATED TELECHELIC POLYOLEFIN COMPOSITIONS AND PROCESSES FOR PREPARING THE SAME DOW GLOBAL TECHNOLOGIES LLC 2021-01-21 US disclosed
WO-2019182993-A1 SILICON-TERMINATED TELECHELIC POLYOLEFIN COMPOSITIONS AND PROCESSES FOR PREPARING THE SAME DOW GLOBAL TECHNOLOGIES LLC (US) 2019-09-26 WO disclosed
WO-2019182992-A1 PROCESS FOR FUNCTIONALIZATION OF ORGANO-ZINC COMPOUNDS WITH HALOSILANES USING BASIC NITROGEN CONTAINING HETEROCYCLES AND SILYL-FUNCTIONALIZED COMPOUNDS PREPARED THEREBY DOW GLOBAL TECHNOLOGIES LLC (US) 2019-09-26 WO disclosed
EP-2599836-B1 CURABLE COMPOSITION FOR SEMICONDUCTOR ENCAPSULATION ADEKA CORP (JP) 2015-03-25 EP disclosed
US-8470937-B2 Curable composition for semiconductor encapsulation ADEKA CORPORATION (JP) 2013-06-25 US disclosed
EP-2599836-A1 CURABLE COMPOSITION FOR SEMICONDUCTOR ENCAPSULATION Adeka Corporation (JP) 2013-06-05 EP disclosed
US-20120126435-A1 CURABLE COMPOSITION FOR SEMICONDUCTOR ENCAPSULATION ADEKA CORPORATION (JP) 2012-05-24 US disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210017195-A1 PROCESS FOR FUNCTIONALIZATION OF ORGANO-ZINC COMPOUNDS WITH HALOSILANES USING BASIC NITROGEN CONTAINING HETEROCYCLES AND SILYL-FUNCTIONALIZED COMPOUNDS PREPARED THEREBY ZRANB2, NISCH, ZKSCAN2 TP53 2664/4885PSIP1 1036/4885MAPT 4473/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.