SCHEMBL706449

SCHEMBL706449

CCc1cccc([SiH2]Br)c1CC

nearest known ligand 0.46

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 4/20 0.46
GABRB2 P47870 4/20 0.46
TAAR1 Q96RJ0 2/20 0.39
HTR1A P08908 1/20 0.36
KCNH2 Q12809 1/20 0.33
SCN5A Q14524 1/20 0.33
CYP2D6 P10635 1/20 0.31
PDK2 Q15119 1/20 0.31
MGLL Q99685 1/20 0.31
DHFR P00374 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21383327 0.79 GABRA1 (0.41) GABRA1GABRB2TAAR1HTR1AKCNH2
SCHEMBL9745359 0.79 GABRA1 (0.46) GABRA1GABRB2TAAR1HTR1AKCNH2
SCHEMBL704995 0.79 GABRA1 (0.41) GABRA1GABRB2TAAR1HTR1AKCNH2
SCHEMBL703208 0.79 GABRA1 (0.41) GABRA1GABRB2TAAR1HTR1AKCNH2
SCHEMBL245773 0.77 GABRA1 (0.57) GABRA1GABRB2TAAR1HTR1AKCNH2
SCHEMBL705069 0.76 GABRA1 (0.34) GABRA1GABRB2
SCHEMBL8009692 0.76 GABRA1 (0.58) GABRA1GABRB2TAAR1HTR1AKCNH2
Bromomethane SCHEMBL27482045 0.75 GABRA1 (0.56) GABRA1GABRB2TAAR1HTR1AKCNH2
Methane SCHEMBL28776675 0.74 GABRA1 (0.55) GABRA1GABRB2TAAR1HTR1AKCNH2
SCHEMBL31498538 0.74 GABRA1 (0.55) GABRA1GABRB2TAAR1HTR1AKCNH2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3768732-A1 PROCESS FOR FUNCTIONALIZATION OF ORGANO-ZINC COMPOUNDS WITH HALOSILANES USING BASIC NITROGEN CONTAINING HETEROCYCLES AND SILYL-FUNCTIONALIZED COMPOUNDS PREPARED THEREBY Dow Global Technologies LLC (US) 2021-01-27 EP disclosed
EP-3768733-A1 SILICON-TERMINATED TELECHELIC POLYOLEFIN COMPOSITIONS AND PROCESSES FOR PREPARING THE SAME Dow Global Technologies LLC (US) 2021-01-27 EP disclosed
US-20210017311-A1 SILICON-TERMINATED TELECHELIC POLYOLEFIN COMPOSITIONS AND PROCESSES FOR PREPARING THE SAME DOW GLOBAL TECHNOLOGIES LLC 2021-01-21 US disclosed
US-20210017195-A1 PROCESS FOR FUNCTIONALIZATION OF ORGANO-ZINC COMPOUNDS WITH HALOSILANES USING BASIC NITROGEN CONTAINING HETEROCYCLES AND SILYL-FUNCTIONALIZED COMPOUNDS PREPARED THEREBY DOW GLOBAL TECHNOLOGIES LLC (US) 2021-01-21 US disclosed
CN-111868110-A Silicon-terminated telechelic polyolefin compositions and methods of making the same 陶氏环球技术有限责任公司 2020-10-30 CN disclosed
CN-111868109-A Method for functionalizing organozinc compounds with halosilanes using basic nitrogen-containing heterocycles and silane-functionalized compounds prepared therefrom 陶氏环球技术有限责任公司 2020-10-30 CN disclosed
WO-2019182992-A1 PROCESS FOR FUNCTIONALIZATION OF ORGANO-ZINC COMPOUNDS WITH HALOSILANES USING BASIC NITROGEN CONTAINING HETEROCYCLES AND SILYL-FUNCTIONALIZED COMPOUNDS PREPARED THEREBY DOW GLOBAL TECHNOLOGIES LLC (US) 2019-09-26 WO disclosed
WO-2019182993-A1 SILICON-TERMINATED TELECHELIC POLYOLEFIN COMPOSITIONS AND PROCESSES FOR PREPARING THE SAME DOW GLOBAL TECHNOLOGIES LLC (US) 2019-09-26 WO disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210017195-A1 PROCESS FOR FUNCTIONALIZATION OF ORGANO-ZINC COMPOUNDS WITH HALOSILANES USING BASIC NITROGEN CONTAINING HETEROCYCLES AND SILYL-FUNCTIONALIZED COMPOUNDS PREPARED THEREBY ZRANB2, NISCH, ZKSCAN2 GABRA1 2195/4885GABRB2 1665/4885TAAR1 2323/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.