SCHEMBL7070134

SCHEMBL7070134

COc1occc1C(=O)Cl

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.36
LMNA P02545 3/20 0.36
HSD17B10 Q99714 2/20 0.35
TSHR P16473 2/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
ALDH1A1 P00352 3/20 0.34
HPGD P15428 2/20 0.34
NPC1 O15118 2/20 0.34
GAA P10253 1/20 0.34
CYP1A1 P04798 1/20 0.33
ABCB1 P08183 1/20 0.33
CYP1B1 Q16678 1/20 0.33
KCNA3 P22001 1/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
MAPK1 P28482 1/20 0.33
ESR2 Q92731 1/20 0.33
KDM4E B2RXH2 1/20 0.33
ALOX15 P16050 1/20 0.32
RAB9A P51151 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8730083 0.80 NNMT (0.41) POLBLMNAHSD17B10TSHRSMN1; SMN2
SCHEMBL7069976 0.79 POLB (0.40) POLBHSD17B10TSHRSMN1; SMN2ALDH1A1
SCHEMBL1164338 0.72
SCHEMBL11668571 0.72 TP53 (0.45) POLBLMNAHSD17B10TSHRSMN1; SMN2
SCHEMBL4441896 0.70 ALDH1A1 (0.37) POLBTSHRALDH1A1NPC1MEN1
SCHEMBL19066745 0.70
SCHEMBL186634 0.69
SCHEMBL3057644 0.68
SCHEMBL15264610 0.68
SCHEMBL7068796 0.68 TP53 (0.38) POLBLMNAHSD17B10TSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1231816-C Photoresist compositions SUMITOMO CHEMICAL CO (JP) 2005-12-14 CN disclosed
EP-0945764-B1 Photoresist composition SUMITOMO CHEMICAL CO (JP) 2003-06-18 EP disclosed
US-6258507-B1 UNSATURATED AROMATIC ACRYLATED ESTER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-07-10 US disclosed
CN-1230704-A Photoresist compositions SUMITOMO CHEMICAL CO (JP) 1999-10-06 CN disclosed
EP-0945764-A2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-09-29 EP disclosed