Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL348204 | 0.87 | TSHR (0.40) | TSHRLMNATDP1THRBALDH1A1 | |
| SCHEMBL704794 | 0.84 | TSHR (0.38) | TSHRLMNATDP1THRBALDH1A1 | |
| Ammonia Solution, Strong SCHEMBL27832272 | 0.84 | TSHR (0.38) | TSHRLMNATDP1THRBALDH1A1 | |
| SCHEMBL703090 | 0.84 | TSHR (0.38) | TSHRLMNATDP1THRBALDH1A1 | |
| SCHEMBL706714 | 0.84 | TSHR (0.38) | TSHRLMNATDP1THRBALDH1A1 | |
| SCHEMBL3482229 | 0.81 | TSHR (0.35) | TSHRLMNATDP1THRBALDH1A1 | |
| SCHEMBL3481875 | 0.81 | TSHR (0.35) | TSHRLMNATDP1THRBALDH1A1 | |
| SCHEMBL2270148 | 0.81 | TSHR (0.35) | TSHRLMNATDP1THRBALDH1A1 | |
| SCHEMBL2273982 | 0.81 | TSHR (0.35) | TSHRLMNATDP1THRBALDH1A1 | |
| SCHEMBL704335 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115605530-B | Polycarbosilazanes and compositions comprising the same and methods of making silicon-containing films using the same | 默克专利有限公司 | 2024-09-27 | — | — | CN | disclosed |
| US-11999827-B2 | Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the same | MERCK PATENT GMBH (DE) | 2024-06-04 | — | — | US | disclosed |
| EP-4146725-B1 | POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2024-05-22 | — | — | EP | disclosed |
| US-20230174724-A1 | POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2023-06-08 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |