Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 5/20 | 0.61 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.49 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.49 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | NPC1 | O15118 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | RAB9A | P51151 | 2/20 | 0.46 |
| ▸ | CASP3 | P42574 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.46 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.46 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.46 |
| ▸ | THRA | P10827 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.42 |
| ▸ | ACACB | O00763 | 1/20 | 0.42 |
| ▸ | ACACA | Q13085 | 1/20 | 0.42 |
| ▸ | PLK1 | P53350 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7065317 | 0.86 | THRB (0.68) | THRBKMT2APLA2G1BATG4BALDH1A1 | |
| SCHEMBL8653178 | 0.85 | THRB (0.63) | THRBKMT2APLA2G1BATG4BALDH1A1 | |
| SCHEMBL16504635 | 0.84 | LMNA (0.46) | KMT2AALDH1A1MAPTRAB9ASMN1; SMN2 | |
| SCHEMBL1516212 | 0.81 | THRB (0.63) | THRBKMT2APLA2G1BATG4BALDH1A1 | |
| SCHEMBL3899589 | 0.80 | THRB (0.66) | THRBKMT2APLA2G1BATG4BALDH1A1 | |
| SCHEMBL7078922 | 0.79 | ALDH1A1 (0.55) | THRBKMT2AALDH1A1NPC1SMN1; SMN2 | |
| SCHEMBL12257673 | 0.79 | MAPT (0.49) | THRBKMT2APLA2G1BATG4BALDH1A1 | |
| SCHEMBL11785681 | 0.79 | THRB (0.64) | THRBKMT2APLA2G1BATG4BALDH1A1 | |
| SCHEMBL11058761 | 0.79 | LMNA (0.50) | KMT2ARAB9ACASP3SENP7SENP6 | |
| SCHEMBL234883 | 0.78 | THRB (0.68) | THRBKMT2APLA2G1BATG4BALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113820920-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2023-07-04 | — | — | CN | disclosed |
| CN-110088680-B | Double-layer photosensitive layer roll | 旭化成株式会社 | 2022-12-30 | — | — | CN | disclosed |
| CN-115185157-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2022-10-14 | — | — | CN | disclosed |
| CN-113820920-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-12-21 | — | — | CN | disclosed |
| CN-107850844-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2021-09-07 | — | — | CN | disclosed |
| US-8409790-B2 | Method of producing a relief image for printing | EASTMAN KODAK COMPANY (US) | 2013-04-02 | — | — | US | disclosed |
| EP-0919871-B1 | Photoimageable composition having improved flexibility, adhesion and stripping characteristics | NICHIGO MORTON CO LTD (JP) | 2003-06-18 | — | — | EP | disclosed |
| US-6558876-B1 | Flexographic element having an infrared radiation ablatable layer capable of being selectively removed by a laser beam | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-05-06 | — | — | US | disclosed |
| US-5928839-A | COATING METAL LAYERS WITH LAYERS OF CURABLE PHOTOIMAGEABLE COMPOSITION, POLYMERIZABLE ACRYLATE MONOMER, OLIGOMER FORMED BY REACTION OF AN EPOXY RESIN AND ACRYLIC OR METHACRYLIC ACID, PHOTOSENSITIVE INITIATOR, EPOXY RESIN, CURING AGENT, CURING | MORTON INTERNATIONAL, INC. (US) | 1999-07-27 | — | — | US | disclosed |
| EP-0919871-A1 | Photoimageable composition having improved flexibility, adhesion and stripping characteristics | Nichigo-Morton Co Ltd (JP) | 1999-06-02 | — | — | EP | disclosed |
| WO-1996041240-A1 | WATER PHOTORESIST EMULSIONS AND METHODS OF PREPARATION THEREOF | W.R. GRACE & CO.-CONN. (US) | 1996-12-19 | — | — | WO | disclosed |
| US-4716093-A | IMPROVED DEVELOPMENT AND STRIPPING | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-12-29 | — | — | US | disclosed |
| US-4257915-A | USE IN PHOTOPOLYMERIZATION OF ETHYLENICALLY UNSATURATED MONOMERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-03-24 | — | — | US | disclosed |