Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.34 |
| ▸ | NR1H3 | Q13133 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | ESR1 | P03372 | 2/20 | 0.32 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | PSIP1 | O75475 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL704588 | 0.87 | NR1H2 (0.42) | NR1H2NR1H3ESR1ESR2 | |
| SCHEMBL707815 | 0.86 | DNM1 (0.36) | TP53NR1H2NR1H3KMT2ATSHR | |
| SCHEMBL704398 | 0.85 | ESR1 (0.32) | NR1H2NR1H3ALDH1A1ESR1ESR2 | |
| SCHEMBL707327 | 0.81 | TP53 (0.35) | TP53NR1H2NR1H3KDM4EALDH1A1 | |
| SCHEMBL704972 | 0.81 | TP53 (0.35) | TP53NR1H2NR1H3KDM4EALDH1A1 | |
| SCHEMBL702836 | 0.80 | TP53 (0.38) | TP53NR1H2NR1H3KDM4EALDH1A1 | |
| SCHEMBL706910 | 0.80 | ALDH1A1 (0.33) | ALDH1A1ESR1ESR2 | |
| SCHEMBL704262 | 0.80 | ALDH1A1 (0.33) | ALDH1A1ESR1ESR2 | |
| SCHEMBL3158814 | 0.79 | NR1H2 (0.37) | NR1H2NR1H3ALDH1A1HPGDESR1 | |
| SCHEMBL3152916 | 0.79 | NR1H2 (0.37) | NR1H2NR1H3HPGDESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9163046-B2 | Process for producing substituted metallocene compounds for olefin polymerization | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2015-10-20 | — | — | US | disclosed |
| US-8791221-B2 | Addition-curable metallosiloxane compound | DAICEL CORPORATION (JP) | 2014-07-29 | — | — | US | disclosed |
| EP-2650319-A1 | ADDITION-CURABLE METALLOSILOXANE COMPOUND | Daicel Corporation (JP) | 2013-10-16 | — | — | EP | disclosed |
| US-20130267653-A1 | ADDITION-CURABLE METALLOSILOXANE COMPOUND | DAICEL CORPORATION (JP) | 2013-10-10 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100113717-A1 | Process For Producing Substituted Metallocene Compounds For Olefin Polymerization | EXXONMOBIL CHEMICAL PATENTS INC. | 2010-05-06 | — | — | US | disclosed |
| US-7709670-B2 | Process for producing substituted metallocene compounds for olefin polymerization | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2010-05-04 | — | — | US | disclosed |
| EP-1866322-B1 | PROCESS FOR PRODUCING SUBSTITUTED METALLOCENE COMPOUNDS FOR OLEFIN POLYMERIZATION | EXXONMOBIL CHEM PATENTS INC (US) | 2010-02-24 | — | — | EP | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| EP-1866322-A2 | PROCESS FOR PRODUCING SUBSTITUTED METALLOCENE COMPOUNDS FOR OLEFIN POLYMERIZATION | ExxonMobil Chemical Patents Inc. (US) | 2007-12-19 | — | — | EP | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20060160968-A1 | Process for producing substituted metallocene compounds for olefin polymerization | EXXONMOBIL CHEMICAL PATENTS INC. | 2006-07-20 | — | — | US | disclosed |
| WO-2006065844-A2 | PROCESS FOR PRODUCING SUBSTITUTED METALLOCENE COMPOUNDS FOR OLEFIN POLYMERIZATION | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2006-06-22 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100113717-A1 | Process For Producing Substituted Metallocene Compounds For Olefin Polymerization | OSBP, OSBPL3, OSBP2 | TP53 4551/4885NR1H2 160/4885NR1H3 112/4885 |
| US-20060160968-A1 | Process for producing substituted metallocene compounds for olefin polymerization | OSBP, OSBPL3, OSBP2 | TP53 4551/4885NR1H2 160/4885NR1H3 112/4885 |
| US-20130267653-A1 | ADDITION-CURABLE METALLOSILOXANE COMPOUND | B2M, MSI2, MNS1 | TP53 3501/4885NR1H2 4265/4885NR1H3 4322/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.