Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 3/20 | 0.43 |
| ▸ | DGKA | P23743 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | FAAH | O00519 | 2/20 | 0.40 |
| ▸ | CES2 | O00748 | 1/20 | 0.40 |
| ▸ | CES1 | P23141 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethyl Pyruvate SCHEMBL3043109 | 0.92 | FAAH (0.42) | MAPTLMNADGKAKDM4EDUSP3 | |
| SCHEMBL7192581 | 0.91 | DGKA (0.42) | MAPTLMNADGKAKDM4EDUSP3 | |
| Dodecane SCHEMBL10783340 | 0.86 | MAPT (0.50) | MAPTLMNADGKAKDM4EDUSP3 | |
| SCHEMBL27312400 | 0.85 | MAPT (0.61) | MAPTLMNADGKAKDM4EDUSP3 | |
| SCHEMBL28177287 | 0.85 | MAPT (0.47) | MAPTLMNADGKAKDM4EDUSP3 | |
| Hexanoate SCHEMBL28713510 | 0.85 | AKR1B1 (0.59) | MAPTLMNAMEN1KMT2A | |
| SCHEMBL11672513 | 0.85 | ALDH1A1 (0.37) | MAPTLMNAKMT2A | |
| SCHEMBL7193128 | 0.84 | MAPT (0.39) | MAPTLMNAKDM4EDUSP3MEN1 | |
| 2-Dodecanone SCHEMBL10785903 | 0.84 | MAPT (0.50) | MAPTLMNADGKAKDM4EDUSP3 | |
| SCHEMBL15796093 | 0.84 | MAPT (0.64) | MAPTLMNADGKAKDM4EDUSP3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20030235778-A1 | Photoresist compositions for short wavelength imaging | SHIPLEY COMPANY, L.L.C. | 2003-12-25 | — | — | US | disclosed |
| US-6596458-B1 | Used in an ultramicrolithography process or another photofabrication process for the production of very large scale integrated circuits or high capacity microchips | FUJI PHOTO FILM CO., LTD. (JP) | 2003-07-22 | — | — | US | disclosed |
| EP-1324133-A1 | Photoresist compositions for short wavelength imaging | Shipley Co. L.L.C. (US) | 2003-07-02 | — | — | EP | disclosed |
| US-6506535-B1 | A positive working photoresist composition for use in the production of semiconductor integrated circuit devices, mask for the production of integrated circuits, printed wiring boards, liquid crystal panels | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-14 | — | — | US | disclosed |
| EP-0851880-B1 | FRACTIONATION OF PHENOL FORMALDEHYDE CONDENSATE AND PHOTORESIST COMPOSITIONS PRODUCED THEREFROM | CLARIANT FINANCE BVI LTD (VG) | 2000-06-28 | — | — | EP | disclosed |
| EP-0851880-A1 | FRACTIONATION OF PHENOL FORMALDEHYDE CONDENSATE AND PHOTORESIST COMPOSITIONS PRODUCED THEREFROM | CLARIANT INTERNATIONAL LTD. (CH) | 1998-07-08 | — | — | EP | disclosed |
| US-5693749-A | DEIONIZATION VIA UNION AND CATION EXCHANGE RESINS, DESOLVENTIZING AND DEHYDRATION VIA DISTILLATION TO OBTAIN A HEAT RESISTANT NOVOLAC RESIN FORMED FROM M-CRESOL, P-CRESOL AND TRIOXANE | HOECHST CELANESE CORPORATION (US) | 1997-12-02 | — | — | US | disclosed |
| WO-1997011101-A1 | FRACTIONATION OF PHENOL FORMALDEHYDE CONDENSATE AND PHOTORESIST COMPOSITIONS PRODUCED THEREFROM | CLARIANT INTERNATIONAL, LTD. (CH) | 1997-03-27 | — | — | WO | disclosed |