SCHEMBL7192581

SCHEMBL7192581

CCCCCC(C)=O.CCOC(=O)C(C)O.O=C(O)OCCOC(=O)O

nearest known ligand 0.46

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.42
MAPT P10636 1/20 0.41
LMNA P02545 3/20 0.37
AKR1B1 P15121 1/20 0.36
PAM P19021 2/20 0.36
FFAR4 Q5NUL3 1/20 0.36
FFAR1 O14842 1/20 0.36
KDM4E B2RXH2 1/20 0.36
DUSP3 P51452 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
ALDH1A1 P00352 1/20 0.35
TSHR P16473 1/20 0.35
SLC22A6 Q4U2R8 1/20 0.35
SLC22A8 Q8TCC7 1/20 0.35
GPR84 Q9NQS5 1/20 0.35
PPARG P37231 1/20 0.35
PPARD Q03181 1/20 0.35
PPARA Q07869 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7074581 0.91 MAPT (0.47) DGKAMAPTLMNAKDM4EDUSP3
SCHEMBL7189063 0.85 DGKA (0.55) DGKAAKR1B1PAMFFAR4FFAR1
SCHEMBL7193128 0.85 MAPT (0.39) MAPTLMNAKDM4EDUSP3MEN1
Acetic Acid Butyl Ester SCHEMBL7189377 0.83 ALDH1A1 (0.56) DGKAMAPTLMNAFFAR1ALDH1A1
Ethyl Pyruvate SCHEMBL3043109 0.83 FAAH (0.42) DGKAMAPTLMNAKDM4EDUSP3
Hexanoate SCHEMBL28713510 0.80 AKR1B1 (0.59) MAPTLMNAAKR1B1FFAR4FFAR1
Dodecane SCHEMBL10783340 0.78 MAPT (0.50) DGKAMAPTLMNAFFAR1KDM4E
SCHEMBL28177287 0.77 MAPT (0.47) DGKAMAPTLMNAKDM4EDUSP3
SCHEMBL27312400 0.77 MAPT (0.61) DGKAMAPTLMNAPAMKDM4E
SCHEMBL11672513 0.77 ALDH1A1 (0.37) MAPTLMNAKMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6506535-B1 A positive working photoresist composition for use in the production of semiconductor integrated circuit devices, mask for the production of integrated circuits, printed wiring boards, liquid crystal panels FUJI PHOTO FILM CO., LTD. (JP) 2003-01-14 US disclosed