Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RIPK1 | Q13546 | 2/20 | 0.51 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.36 |
| ▸ | SLC7A5 | Q01650 | 8/20 | 0.35 |
| ▸ | CTSK | P43235 | 2/20 | 0.34 |
| ▸ | CASR | P41180 | 1/20 | 0.34 |
| ▸ | HTR2A | P28223 | 2/20 | 0.33 |
| ▸ | HRH1 | P35367 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.33 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL705122 | 0.89 | RIPK1 (0.56) | RIPK1SLC6A4HTR2AHRH1LMNA | |
| SCHEMBL703009 | 0.80 | POLB (0.41) | SLC6A4SLC7A5CTSKCASR | |
| SCHEMBL707195 | 0.79 | SLC7A5 (0.39) | RIPK1SLC6A4SLC7A5CASRHTR2A | |
| SCHEMBL702729 | 0.79 | SLC7A5 (0.42) | SLC6A4SLC7A5HTR2A | |
| SCHEMBL713133 | 0.78 | RIPK1 (0.41) | RIPK1SLC6A4HTR2AHRH1LMNA | |
| SCHEMBL704444 | 0.77 | CYP19A1 (0.43) | SLC7A5HTR2A | |
| SCHEMBL706088 | 0.77 | CYP19A1 (0.43) | SLC7A5HTR2A | |
| SCHEMBL15327775 | 0.77 | HRH1 (0.40) | SLC6A4SLC7A5HTR2AHRH1 | |
| SCHEMBL5704251 | 0.77 | HRH1 (0.59) | SLC6A4SLC7A5HTR2AHRH1SLC6A2 | |
| SCHEMBL12928765 | 0.76 | RIPK1 (0.85) | RIPK1SLC6A4LMNASLC6A2SLC6A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |