SCHEMBL7076929

SCHEMBL7076929

O=C1C=CC(=O)N1c1ccc(S(=O)(=O)O)cc1.[N-]=[N+]=N

nearest known ligand 0.50

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 15/20 0.50
FAAH O00519 5/20 0.50
HSP90AA1 P07900 3/20 0.47
TDP1 Q9NUW8 2/20 0.47
PKM P14618 1/20 0.47
MAPK1 P28482 1/20 0.47
NPSR1 Q6W5P4 1/20 0.47
DDAH1 O94760 1/20 0.43
LMNA P02545 2/20 0.42
ALDH1A1 P00352 1/20 0.42
CCR6 P51684 1/20 0.42
CACNA1B Q00975 1/20 0.42
APBA1 Q02410 1/20 0.42
APOBEC3G Q9HC16 1/20 0.42
BCHE P06276 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1830817 0.89 MGLL (0.62) MGLLFAAHHSP90AA1TDP1PKM
SCHEMBL4837136 0.88 MGLL (0.60) MGLLFAAHHSP90AA1TDP1PKM
SCHEMBL15082418 0.78 MGLL (0.47) MGLLFAAHHSP90AA1TDP1PKM
SCHEMBL331305 0.74 MGLL (0.68) MGLLFAAHHSP90AA1TDP1PKM
SCHEMBL9718403 0.74 MGLL (0.68) MGLLFAAHHSP90AA1TDP1PKM
SCHEMBL6917519 0.73 MGLL (0.50) MGLLFAAHHSP90AA1TDP1PKM
SCHEMBL32665177 0.71 MGLL (0.62) MGLLFAAHHSP90AA1TDP1PKM
SCHEMBL5121066 0.71 ALDH1A1 (0.49) TDP1PKMMAPK1LMNAALDH1A1
SCHEMBL1632277 0.71 CA1 (0.63) MGLLFAAHHSP90AA1TDP1PKM
SCHEMBL28752490 0.71 MGLL (0.62) MGLLFAAHHSP90AA1TDP1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1012672-B1 A NEGATIVELY ACTING PHOTORESIST COMPOSITION BASED ON POLYIMIDE PRECURSORS ARCH SPEC CHEM INC (US) 2003-08-13 EP disclosed
EP-0798597-B1 Negative working photoresist composition based on polyimide precursors ARCH SPEC CHEM INC (US) 2003-07-02 EP disclosed
EP-1012672-A4 A NEGATIVELY ACTING PHOTORESIST COMPOSITION BASED ON POLYIMIDE PRECURSORS ARCH SPEC CHEM INC (US) 2000-11-29 EP disclosed
EP-1012672-A1 A NEGATIVELY ACTING PHOTORESIST COMPOSITION BASED ON POLYIMIDE PRECURSORS ARCH SPECIALTY CHEMICALS, INC. (US) 2000-06-28 EP disclosed
US-6010825-A Negatively acting photoresist composition based on polyimide precursors OLIN MICROELECTRONICS CHEMICALS, INC. (US) 2000-01-04 US disclosed
WO-1999013381-A1 A NEGATIVELY ACTING PHOTORESIST COMPOSITION BASED ON POLYIMIDE PRECURSORS ARCH SPECIALTY CHEMICALS, INC. (US) 1999-03-18 WO disclosed
US-5856065-A BLEND CONTAINING PHOTOINITIATOR AND ORGANOSILICON COMPOUND OLIN MICROELECTRONIC CHEMICALS, INC. (US) 1999-01-05 US disclosed
EP-0798597-A1 Negative working photoresist composition based on polyimide primers Olin Microelectronic Chemicals, Inc. (US) 1997-10-01 EP disclosed
US-5177056-A PLASTICS COMPOSITION CONTAINING SUPERCONDUCTORS CIBA-GEIGY CORPORATION (US) 1993-01-05 US disclosed
US-5011755-A Relief Images CIBA-GEIGY CORPORATION (US) 1991-04-30 US disclosed
US-4552815-A Prestressing elements coated with plastic material and process for making them CIBA GEIGY CORPORATION (US) 1985-11-12 US disclosed