SCHEMBL707897

SCHEMBL707897

CCO[SiH](OCC)C(CC)c1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.42
POLB P06746 1/20 0.37
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
MIF P14174 1/20 0.35
TRPA1 O75762 2/20 0.34
HKDC1 Q2TB90 1/20 0.34
MMP8 P22894 1/20 0.34
GAA P10253 1/20 0.34
TAAR1 Q96RJ0 3/20 0.33
AOC3 Q16853 1/20 0.33
HTR2A P28223 1/20 0.33
HRH1 P35367 1/20 0.33
CYP2D6 P10635 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL703457 0.85 AOC3 (0.39) LMNAPOLBMEN1KMT2ATRPA1
SCHEMBL3341511 0.85 LMNA (0.35) LMNAPOLBMEN1KMT2ATRPA1
SCHEMBL702246 0.85 LMNA (0.39) LMNAMEN1KMT2AMIFHKDC1
SCHEMBL19470827 0.82 POLB (0.42) LMNAPOLBAOC3HTR2AHRH1
SCHEMBL706283 0.82 LTA4H (0.41) LMNAPOLB
SCHEMBL705765 0.82 LMNA (0.43) LMNAPOLBMEN1KMT2AMIF
SCHEMBL8138640 0.81 SLC6A2 (0.38) LMNAPOLBAOC3
SCHEMBL17937724 0.81 GAA (0.35) LMNAMEN1KMT2AGAAHTR2A
SCHEMBL19470881 0.80 POLB (0.38) LMNAPOLBHTR2A
SCHEMBL115878 0.79 TAAR1 (0.40) LMNAPOLBMEN1KMT2ATRPA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112126065-A Preparation method of solid silicon carbide ceramic precursor 长沙科航特种织造有限公司 2020-12-25 CN claimed
CN-112126064-A Preparation method of novel solid silicon carbide ceramic precursor 长沙科航特种织造有限公司 2020-12-25 CN claimed
CN-112126067-A Preparation method and application of novel liquid silicon carbide ceramic precursor 宁波曙翔新材料股份有限公司 2020-12-25 CN claimed
CN-112094414-A Preparation method of novel liquid silicon carbide ceramic precursor 宁波曙翔新材料股份有限公司 2020-12-18 CN claimed
CN-111925386-A Preparation method of novel silicon carbide ceramic precursor 长沙科航特种织造有限公司 2020-11-13 CN claimed
US-20240158543-A1 Solid Catalyst For Producing Polypropylene And Method For Preparation Of Propylene-Derived Polymer HANWHA TOTALENERGIES PETROCHEMICAL CO., LTD. (KR) 2024-05-16 US disclosed
EP-4361186-A1 SOLID CATALYST FOR PRODUCING POLYPROPYLENE AND METHOD FOR PREPARATION OF PROPYLENE-DERIVED POLYMER Hanwha TotalEnergies Petrochemical Co., Ltd. (KR) 2024-05-01 EP disclosed
CN-117924563-A Solid catalyst for preparing polypropylene and method for preparing propylene derivative polymer 韩华道达尔能源有限公司 2024-04-26 CN disclosed
EP-3683243-B1 PROCESS OF MANUFACTURE OF CATALYST AND PROPYLENE POLYMER THAT USE THIS OR COPOLYMER FOR PROPYLENE POLYMERIZATION HANWHA TOTALENERGIES PETROCHEMICAL CO LTD (KR) 2024-01-24 EP disclosed
CN-111349185-B Solid catalyst for propylene polymerization and method for producing block copolymer using the same 韩华道达尔能源有限公司 2023-02-03 CN disclosed
CN-111171195-B Propylene polymerization solid catalyst for reducing VOC and method for producing polypropylene using the same 韩华道达尔能源有限公司 2022-12-27 CN disclosed
US-11434315-B2 Propylene polymerizing solid catalyst for reducing VOC and method of producing polypropylene using same HANWHA TOTAL PETROCHEMICAL CO., LTD. (KR) 2022-09-06 US disclosed
EP-2511303-A2 MANUFACTURING METHOD OF SOLID CATALYST FOR PROPYLENE POLYMERIZATION Samsung Total Petrochemicals Co. Ltd. (KR) 2012-10-17 EP disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
EP-0590954-B1 Epoxy-functional silicone resin DOW CORNING (US) 1998-09-09 EP disclosed
EP-0590954-A2 Epoxy-functional silicone resin DOW CORNING CORPORATION (US) 1994-04-06 EP disclosed
US-5280098-A Using an organotitante catalyst DOW CORNING CORPORATION (US) 1994-01-18 US disclosed